PATENT ABSTRACTS OF JAPAN
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`(43)Date of publication of application : 12.03.2002
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`(l l)Publication number :
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`2002-071928
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`(51)Int.Cl.
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`G02B 5/20
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`G02F
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`1/1335
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`(21)Application number : 2000-252734
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`(7l)Applicant : FUJI PHOTO FILM CO LTD
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`(72)Inventor : MASUDA TOSHIYUKI
`23.08.2000
`(22)Date of filing :
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`(54) METHOD FOR MANUFACTURING COLOR FILTER
`
`(57)Abstract:
`PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter on which a
`coloring film and a black matrix are formed so as to own a mutually overlapping region, of
`which the overlapping region has no protrusion from a coloring film surface and is excellently
`smooth, and which enables to display a uniform picture.
`SOLUTION: In the method of manufacturing a color filter by forming the coloring film and the
`black matrix containing resin on a substrate, the method is characterized by having a step for
`polishing the surface of a color filter film consisting of the black matrix containing the resin and
`the coloring film formed on the substrate and by setting chromaticity of the coloring film before
`the polishing so as to make chromaticity of the coloring film after the polishing have a desired
`chromaticity.
`
`[Detailed Description of the Invention]
`
`[0001]
`
`[Field of the |nvention]This invention relates to the manufacturing method of the suitable light filter for
`
`various liquid crystal display elements, such as a CCD camera and a color liquid crystal display (LCD), a
`
`color image sensor, etc.
`
`[0002]
`
`[Description of the Prior Art]The black matrix aiming at improvement in display contrast is formed in
`
`each pixel which generally consists of a coloring layer of red (R) green (G) blue (B), and its gap, and the
`
`light filter used for a color liquid crystal display etc. is constituted. Generally, to the black matrix formed
`
`using metal and black resin, such as chromium (Cr), a coloring layer is formed so that it may have an
`
`overlapping region in the edge slightly.
`
`[0003]|n the case of the black matrix which consists of metal membranes, Since the thickness is a thin
`
`film which is 0.1-0.2 micrometer, even if it is formed so that the edge and the black matrix of a coloring
`
`layer may lap mutually, the thickness of an overlapping region does not become so thick that the
`
`smooth nature of a color filter surface is spoiled and it interferes with liquid crystal display. That is, the
`
`level difference of protuberance form is not made on on the surface of a color filter film.
`
`[0004]However, in the case of the black matrix containing the resinous principle by which black coloring
`
`

`

`was carried out, sufficient optical density can seldom be obtained with thin film past **, but for securing
`
`the optical density of 3.0 or more, thickness needs to be 1.0 micrometers or more. However, if a
`
`coloring layer is formed so that the edge of a coloring layer may lap on the black matrix which has
`
`thickness of 1.0 micrometers or more, as shown in drawing 1. This overlapping region a may make the
`
`convex height 3, and, moreover, 1 micrometer of the surface of the coloring layer 1 of the field where
`
`thickness b of the height 3 does not lap with the black matrix 2 to 0.3 micrometers or more may also
`
`become thick depending on the case. Carry out spreading formation especially of the black matrix like
`
`formation of other coloring layers with the coating liquid containing a resinous principle, or, Or when it
`
`is going to transfer and form the coloring layer of a transfer material (transfer method), formation of the
`
`above heights cannot be avoided, but in depending the layer of fixed thickness on the aforementioned
`
`transfer method which carries out transfer lamination moreover, it appears notably especially.
`
`[0005]Although the surface of a light filter is originally wanted to be excellent in smooth nature from a
`
`viewpoint of improving the liquid-crystal-display characteristic, if the above-mentioned height exists, the
`
`smooth nature will be spoiled. Therefore, if it has the above heights on the surface of the light filter
`
`used as a contact surface with a liquid crystal material, when liquid crystal display is carried out, the
`
`orientation of a liquid crystal element will be in disorder around this height, and it will become a factor
`
`which causes the fall of display unevenness or contrast.
`
`[0006]As a means to avoid degradation of the smooth nature by the thickness of the above overlapping
`
`regions conventionally, on the color filter film which consists of a coloring layer and a black matrix,
`
`spreading formation of the overcoat layer was carried out further, and processing of considering it as a
`
`smooth surface has been performed. However, a means to smooth a color filter film surface was
`
`desired, without there being concern of causing the fall of the yield and providing an overcoat layer,
`
`when spreading formation of the overcoat layer was carried out.
`
`[0007]On the other hand, although grinding the surface of a color filter film is generally performed,
`
`polish here is polish in a meaning smoothed as [ interfere / with next processing/ remove a foreign
`
`matter adhering to a color filter film surface to some extent, and].
`
`Since the color filter film itself is projected and formed in convex, it differs from deleting this film itself
`
`extensively and carrying out a flattening uniformly.
`
`That is, cleaning polish which removes the foreign matter which interferes with spreading in order to,
`
`attain improvement (for example, evasion of application unevenness, etc.) of the spreading nature of
`
`the coating liquid for forming an overcoat layer for example, is performed from the former. Specifically,
`
`the whole surface polishing method ground using a polishing pad is known, for example. It is ground by
`
`contacting and rotating the surface plate which stuck the cloth which transplanted hair to a color filter
`
`film surface etc. in this method. However, control of each difference of the hardness of a RGB film and a
`
`black-matrix film, etc. to polishing quantity is difficult, and it is difficult to fully remove a foreign matter
`
`and to carry out a flattening with high precision.
`
`[0008]|n JP,H8-68993,A, the method of grinding the foreign matter on a light filter selectively is
`
`proposed using the abrasive tape which coated belt material with polished abrasive. Since it grinds
`
`according to a RGB film, each form, hardness of a shade part, etc. according to this method, a highly
`
`precise flattening is locally possible, removing a foreign matter surely, but wide range high-speed polish
`
`has the fault of being unsuitable. Therefore, when a color filter film has an overlapping region with
`
`which each RGB film and a black matrix lap mutually and is formed, the convex aforementioned
`
`

`

`overlapping region is crossed to an entire substrate, and it exists, but the whole surface of this film
`
`surface cannot be ground uniformly and at high speed.
`
`[0009]As mentioned above, in the light filter formed so that the black matrix of the coloring layer of 3
`
`colors of R68 and resin content might have an overlapping region mutually, The actual condition is that
`
`the light filter which can be displayed stably without there being no height in this overlapping region,
`
`excelling in smooth nature, and being accompanied by the fall of display unevenness or contrast is not
`
`yet provided.
`
`[0010]
`
`[Problem to be solved by the invention]This invention solves the problems in the aforementioned
`
`former, and makes it problem to attain the following purposes. Namely, this invention is formed so that
`
`a coloring layer and a black matrix may have an overlapping region mutually, The surface of the color
`
`filter film in which this overlapping region does not project from the surface of a coloring layer, but
`
`includes this field is excellent in smooth nature, and aims at providing the manufacturing method of the
`
`light filter which can manufacture the light filter which can carry out image display to high contrast
`
`without display unevenness.
`
`[0011]
`
`[Means for solving problem]The above-mentioned The means for solving a technical problem is as
`
`follows. Namely, in the manufacturing method of the light filter which forms a coloring layer and a resin
`
`content black matrix on <1> board, and produces a light filter, It is a manufacturing method of the light
`
`filter setting up the chromaticity of the coloring layer before polish so that it may have the process of
`
`grinding the surface of the color filter film in which it comes to form a resin content black matrix and a
`
`coloring layer on a substrate and the chromaticity of the coloring layer after polish may turn into a
`
`desired chromaticity.
`
`[0012]On <2> boards, laminate the photosensitive transfer material which has a photosensitive resin
`
`layer, and the aforementioned photosensitive resin layer is transferred, It is a manufacturing method of
`
`the light filter which forms a coloring layer and a resin content black matrix, and produces a light filter, It
`
`is a manufacturing method of the light filter having the process of grinding the surface of the color filter
`
`film which consists of the coloring layer and resin content black matrix which were formed on the
`substrate.
`
`[0013]|t is a manufacturing method of a light filter given in the above <2> which sets up the chromaticity
`
`of the coloring layer before polish so that the chromaticity of the coloring layer after <3> polishes may
`
`turn into a desired chromaticity.
`
`It is a manufacturing method of a light filter given in either of aforementioned <1>- <3> which performs
`
`surface lapping of <4> color filter films by chemical polishing.
`
`[0014]
`
`[Mode for carrying out the invention]The first mode of the manufacturing method of the light filter of
`
`this invention, The chromaticity of the coloring layer before polish is set up so that it may have the
`
`process of grinding the surface of the color filter film in which it comes to form two or more coloring
`
`layers and resin content black matrices on a substrate and the chromaticity of the coloring layer after
`
`polish may turn into a desired chromaticity.
`
`[0015]The second mode of the manufacturing method of the light filter of this invention, Laminate the
`
`photosensitive transfer material which has a photosensitive resin layer on a substrate using two or more
`
`

`

`photosensitive transfer materials, and the aforementioned photosensitive resin layer is transferred, It is
`
`a manufacturing method of the light filter which forms the coloring layer and resin content black matrix
`
`of a plural color, It is characterized by having the process of grinding the surface of the color filter film
`
`which consists of the coloring layer and resin content black matrix which were formed on the substrate,
`
`and the chromaticity of the coloring layer before grinding preferably in the range from which the
`
`chromaticity of the coloring layer after polish turns into a desired chromaticity is set up. Hereafter, the
`
`manufacturing method of the light filter of this invention is explained in detail.
`
`[0016]The manufacturing method of the light filter of this invention of the above-mentioned first and
`
`the second mode, The process (it may be hereafter called a "black matrix formation process".) of
`
`forming a resin content black matrix in the substrate (a "substrate" is only called hereafter.) which
`
`constitutes a light filter fundamentally, The process (it may be hereafter called a "coloring layer
`
`formation process".) of forming the coloring layer of R (red), G (green), and B (blue) in a substrate, The
`
`process of grinding the surface of the color filter film which consists of the coloring layer and resin
`
`content black matrix which were formed on the substrate. (It may be hereafter called a "polishing
`
`process".) It has at least and the color filter film formed as a coloring layer and a resin content black
`
`matrix had an overlapping region mutually is provided on a substrate.
`
`[0017]As for the aforementioned black matrix formation process and a coloring layer formation process,
`
`although any may be previous processes, it is common to make a black matrix formation process into a
`
`previous process from the viewpoint of the optical density of an overlapping region with the coloring
`
`layer of a black matrix and a viewpoint of the accuracy of position of a colored pixel. Here, the accuracy
`
`of position of a colored pixel says accuracy when it sees by penetration, and becomes important [the
`
`position of a black matrix and the accuracy of width ]. Therefore, it is desirable at the point which
`
`influence does not have a direction in case a black matrix formation process is a previous process in the
`
`accuracy of a black matrix even if it deletes the height of an overlapping region, and does not produce a
`
`large concentration change, either. When making a black matrix formation process into a next process, if
`
`the height of an overlapping region is deleted, the overlapping region itself will be lost, and there is a
`
`possibility that the position shift which is a pixel may actualize.
`
`[0018]Pass the aforementioned black matrix formation process and a coloring layer formation process in
`
`this invention, After forming on a substrate the color filter film (a "color filter film" is only called
`
`hereafter.) which consists of a coloring layer and a resin content black matrix, the polishing process
`
`which grinds the surface of this color filter film is established. First, a characteristic polishing process is
`
`explained in this invention.
`
`[0019](Polishing process) In the aforementioned polishing process, the surface of the color filter film
`
`which consists of the resin content black matrix and coloring layer which were formed on the substrate
`
`is ground.
`
`[0020]Since the coloring layer 1 is formed in the light filter concerning this invention so that it may have
`
`overlapping region a slightly to the black matrix 2 in the peripheral edge part as shown, for example in
`
`drawing 1, As a result of this overlapping region a‘s constituting the convex thick film part (henceforth a
`
`"height") 3 in which only the thickness b projected from the surface to the field with which the coloring
`
`layer 1 and the black matrix 2 do not lap mutually, the smooth nature of a color filter film is spoiled
`
`substantially. Since thickness b of an overlapping region becomes close to the sum total of the thickness
`
`of about two layers like the below-mentioned mode (A) especially when a coloring layer and a black
`
`

`

`matrix are formed using a photosensitive transfer material, degradation of smooth nature becomes
`
`more remarkable. That is, since close arrangement of the liquid crystal material is carried out at color
`
`filter film Kami and the height 3 is located in the liquid crystal material side at a convex, when liquid
`
`crystal display is carried out, the orientation of a liquid crystal element is in disorder around the height
`
`3, and the fall of display unevenness or contrast is caused. Especially, it becomes a problem, when
`
`thickness b of overlapping region a is set to 0.3 micrometers or more, or especially when the angle alpha
`
`which the surface and the height 3 of the coloring layer 1 make is the form which becomes large. On the
`
`contrary, it is also the same as when a black matrix is formed after coloring layer formation.
`
`[0021]|n this invention, after forming a color filter film with the coloring layer formation process and
`
`black matrix formation process which are mentioned later, a polishing process is established, and in this
`
`polishing process, the surface of a color filter film is ground uniformly. Polish is performed to the whole
`
`surface on the surface of a color filter film, and the height which can lap and do a coloring layer and a
`
`black matrix is removed. If only a convex height is removed from the above, it is sufficient here, but in
`
`the polishing process concerning this invention, it is smoothed by crossing all over a color filter film
`
`substantially, and grinding.
`
`[0022]Although it changes with surface states of a color filter film, the grade of polish, What is necessary
`
`is to be suitably chosen according to the state of the height circumference, and just to be able to grind
`
`to such an extent that the height which projects from the surface of a coloring layer does not cause the
`
`display unevenness of a liquid crystal display, It may grind so that both a coloring layer and a black
`
`matrix may be deleted, and it may grind so that only a real coat color film may be shaved.
`
`[0023]As a method of grinding the surface of a color filter film, abrasive grains, such as an alumina
`
`particle, are used, and the chemical-polishing method ground under a wet type is preferred, for
`
`example, can grind suitably using pieces, such as SP-800 (made by a speed femme company), of polish
`
`equipment. As particle diameter of the aforementioned abrasive grain, 0.5-1.0 micrometer is preferred.
`
`[0024]In [ in performing the aforementioned polishing process] this invention, A chromaticity (in a black
`
`matrix, it is concentration) and thickness form beforehand the color filter film which consists of the
`
`coloring layer and black matrix which it comes to set up highly on the substrate, and it grinds so that the
`
`coloring layer (and/or, black matrix of the concentration of a request) of a desired chromaticity may be
`
`obtained. Since the chromaticity of the coloring layer before polish will be set up so that the
`
`chromaticity of the coloring layer after polish may turn into a desired chromaticity although the light
`
`filter which an early chromaticity changes and has a desired chromaticity is not obtained if the coloring
`
`layer general already set as the desired chromaticity is ground, the chromaticity gap by polish is not
`
`produced.
`
`[0025]By adopting the aforementioned polishing process concerning this invention, it can smooth with
`
`sufficient accuracy uniformly and the coloring layer which has a desired chromaticity, and the color filter
`
`film which consists of a black matrix more than the concentration of a request can be formed. And in
`
`this polishing process, since the whole surface of a color filter film is ground uniformly, Even if it is a case
`
`where the light filter excellent in especially surface smoothness can be formed at high speed, and color
`
`filter film surfaces other than the aforementioned overlapping region have a defect by adhesion of a
`
`foreign matter etc., the light filter which removes this defect and does not have a defect is producible.
`
`[0026]Next, a coloring layer formation process and a black matrix formation process are explained. As
`
`the aforementioned coloring layer formation process and a black matrix formation process, The
`
`

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`photosensitive transfer material which has a photosensitive resin layer which comes to carry out
`
`spreading formation of the photosensitive resist on temporary support is used, and after applying on a
`
`substrate the mode [mode (A)] which is transferred, exposed and developed and is formed on a
`
`substrate, or a photosensitive resist, the mode [mode (8)] developed [ is exposed and ] and formed is
`
`mentioned. As the aforementioned photosensitive transfer material, the dry film for pixel formation, the
`
`photosensitive black resin sheet for black-matrix formation, etc. are mentioned.
`
`[0027]|n the first above-mentioned mode, as the aforementioned coloring layer formation process and a
`
`black matrix formation process, which mode of the aforementioned mode (A) and a mode (B) may be
`
`adopted, one of processes is made into a mode (A), and it is good also considering the process of the
`
`other as a mode (B). In the second above-mentioned mode, the aforementioned mode (A) is adopted as
`
`the aforementioned coloring layer formation process and a black matrix formation process.
`
`[0028]|n the chromaticity of R68 of the photosensitive resin layer of a photosensitive transfer material
`
`used in a mode (A) in this invention so that it may mention later, the black density of the photosensitive
`
`resin layer of the photosensitive transfer material for black, or a mode (B), The chromaticity after polish
`
`sets beforehand the chromaticity of R68 of the photosensitive resin layer which carried out spreading
`
`formation with the coating liquid for photosensitive resin layers, and the black density of the black
`
`matrix layer which carried out spreading formation with the coating liquid for black matrices as the
`
`range used as a desired chromaticity.
`
`[0029](Coloring layer formation process) In the aforementioned coloring layer formation process, as the
`
`coloring layer, R (red), G (green), and B (blue), of 3 colors has the edge and the overlapping region of a
`
`black matrix which are mentioned later, it is formed.
`
`[0030]- In the mode (A)-aforementioned mode (A), form a coloring layer by exposing to a desired
`
`pattern and also carrying out a development after transferring the aforementioned photosensitive resin
`
`layer on a substrate using the photosensitive transfer material which has a photosensitive resin layer in
`
`which it comes to provide the photosensitive resist material colored on temporary support. Here, the
`
`coloring layer which consists of R68 can be formed by repeating transfer, exposure, and development
`
`and performing them on the same substrate, using two or more photosensitive transfer materials which
`
`have a photosensitive resin layer of respectively different hue.
`
`[0031][Photosensitive transfer material] The aforementioned photosensitive transfer material has a
`
`photosensitive resin layer at least on temporary support, and it comes to provide intermediate layers,
`
`such as a thermoplastic resin layer and an oxygen filter layer, between temporary support and a
`
`photosensitive resin layer if needed. It is preferred that the aforementioned photosensitive resin layer is
`
`provided with the cover film in order to protect a photosensitive resin layer at the time of preservation.
`
`[0032]<Temporary support> As the aforementioned temporary support, it is flexibility and it is preferred
`
`to have a photosensitive resin layer etc. and good detachability and to comprise a stable substance
`
`chemically and thermally. Specifically, films or such laminated material, such as Teflon (registered
`
`trademark), polyethylene terephthalate, polycarbonate, polyethylene, and polypropylene, are
`
`preferred. As thickness of temporary support, 5-300 micrometers is suitable and 20-150 micrometers is
`
`especially preferred.
`
`[0033]<Photosensitive resin layer> The aforementioned photosensitive resin layer applies the coating
`
`liquid (coating liquid for photosensitive resin layers) which contains a photosensitive resin composition
`
`and colorant at least on temporary support with a publicly known coating method, and is formed. The
`
`

`

`aforementioned photosensitive resin layer is a coloring layer containing a photosensitive resin
`
`composition and colorant, and it is preferred that it is a resin layer softened or mobilized with heat or a
`
`pressure. It is preferred to have transfer **** which specifically shows the thermoplasticity which has
`
`softening or adhesiveness at the temperature of at least 150 degrees C or less, and as for a non-
`
`irradiation part, if light is irradiated, while hardening, it is preferred to have resist nature by soluble to
`
`an alkali solution. Most layers consisting of a publicly known photopolymerization nature constituent
`
`have this character. Refining is still more possible for these layers by addition of thermoplastics, and
`
`addition of a plasticizer with compatibility.
`
`[0034]As the aforementioned photosensitive resin composition, all the things of a description can be
`
`used, for example for JP,H3-282404,A, For example, the photosensitive resin composition and cinnamic
`
`acid type photosensitive resin composition consisting of the photosensitive resin composition, the
`
`Mitsushige composition constituent and azide compound consisting of negative-mold diazo resin and a
`
`binder, and a binder are mentioned. Alkali solubility binder polymer, the monomer which has an
`
`ethylenic unsaturated double bond which carries out addition condensation by the exposure of light
`
`especially, The photosensitive resin composition containing a photopolymerization initiator is preferred,
`
`and especially the photosensitive resin layer containing this photosensitive resin composition and
`
`colorant is preferred in this invention.
`
`[0035]As the aforementioned alkali solubility binder polymer, The polymer which has a carboxylic acid
`
`group in a side chain, for example, JP,SS9-44615,A, JP,SS4-34327, B, JP,558-12577,B, JP,SS4-25957,B, The
`
`methacrylic acid copolymer of a description, an acrylic acid copolymer, an itaconic acid copolymer, a
`
`crotonic acid copolymer, a maleic acid copolymer, and a partial esterification maleic acid copolymer are
`
`mentioned to JP,SS9-53836,A and JP,SS9-71048,A. The cellulose derivative which has a carboxylic acid
`
`group can also be mentioned to a side chain.
`
`[0036]What added the cyclic anhydride to the polymer which has a hydroxyl group other than the above
`
`is preferred. In particular, the copolymer of the benzyl (meta) acrylate and acrylic acid (meta) of a
`
`description and the plural copolymers of benzyl (meta) acrylate, acrylic acid (meta), and other
`
`monomers can be mentioned in the US,4139391,B Description.
`
`[0037]When using the aforementioned alkali solubility binder polymer, it is preferred to use it out of the
`
`above, choosing what has the acid value of the range of 50 - 300 mgKOH/g and the average molecular
`
`weight of the range of 1000-300000.
`
`[0038]Polymer of alkali insolubility can be added in the range which does not have an adverse effect on
`
`developability etc. in order to improve, various performances, for example, the intensity of a hardening
`
`layer, besides the aforementioned alkali solubility binder polymer. As such polymer, alcoholic soluble
`
`nylon or an epoxy resin is mentioned.
`
`[0039]As a total content of polymer of alkali insolubility, the 10 - 95 mass % is preferred [for alkali
`
`solubility/ polymer and if needed ] over the total solids of a photosensitive resin composition, and the
`
`20 - 90 mass % is more preferred. When the adhesiveness of a photosensitive resin layer may be too
`
`high when the aforementioned content is less than the 10 mass %, and the 95 mass % is exceeded, it
`
`may be inferior in respect of the intensity of the picture formed, and photosensitivity.
`
`[0040]As a monomer which has an ethylenic unsaturated double bond which carries out addition
`
`condensation, into a molecule, it has an ethylenic unsaturation group in which at least one addition
`
`condensation is possible, and a not less than 100 degrees C compound is mentioned for the boiling point
`
`

`

`by the exposure of the aforementioned light by ordinary pressure. For example, monofunctional
`
`acrylate and monofunctional methacrylate, such as polyethylene-glycol mono- (meta) acrylate,
`
`polypropylene-glycol mono- (meta) acrylate, and phenoxyethyl (meta) acrylate;
`
`[0041]Po|yethy|ene glycol di(meta)acrylate, polypropylene glycol di(meta)acrylate, Trimethylol
`
`triacrylate, trimethylolpropane triacrylate, Trimethylolpropane diacrylate, neopentyl glycol
`
`di(metha)acrylate, Pentaerythritol tetra (meta) acrylate, pentaerythritol tri(meta)acrylate,
`
`Dipentaerythritol hexa (meta) acrylate, dipentaerythritol penta (meta) acrylate, Hexanediol
`
`di(metha)acrylate, trimethylolpropane bird (acryloyloxypropyl) ether, Bird (acryloyloxyethyl)
`
`isocyanurate, bird (acryloyloxyethyl) cyanurate, Glycerin bird (meta) acrylate; after adding propylene
`
`oxide to polyfunctional alcohol, such as trimethylolpropane and glycerin, at ethylene oxide (meta),
`
`polyfunctional acrylate and polyfunctional methacrylate, such as what was acrylate-ized, can be
`mentioned.
`
`[0042]Urethane acrylate given in JP,S48-41708,B, JP,S50-6034,B, and JP,S51-37193,A; JP,S48-64183,A,
`
`Polyester acrylates given in JP,S49-43191,B and JP,552-30490,B; polyfunctional acrylate and
`
`methacrylate, such as epoxy acrylate which are the resultants of an epoxy resin and acrylic acid (meta),
`
`are also mentioned. Also in the above, trimethylolpropane bird (meta) acrylate, pentaerythritol tetra
`
`(meta) acrylate, dipentaerythritol hexa (meta) acrylate, and dipentaerythritol penta (meta) acrylate are
`
`preferred.
`
`[0043]The monomer which has an ethylenic unsaturated double bond which carries out addition
`
`condensation by the exposure of light may be used independently, or may mix and use two or more
`
`kinds. As content of this monomer to the total solids of a photosensitive resin composition, the 5 - 50
`
`mass % is common, and especially the 10 - 40 mass % is preferred. |f photosensitivity and the intensity
`
`of a picture may fall when the aforementioned content is less than the 5 mass %, and the 50 mass % is
`
`exceeded, the adhesiveness of a photosensitive resin layer may become superfluous and it is not
`desirable.
`
`[0044]A vicinal poly beam RUDONIRU compound given [as the aforementioned photopolymerization
`
`initiator] in the US,2367660,B Description, An acyloin ether compound given in the US,2448828,B
`
`Description, The aromatic acyloin compound replaced by the US,2722512,B Description with alpha-
`
`hydrocarbon of the description, A polynuclear quinone compound given in the US,3046127,B
`
`Description and a 2951758 Description, The combination of a triarylimidazole dimer and p-aminoketone
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`given in the US,3549367,B Description, A benzothiazole compound and a trihalomethyl s-triazine
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`compound given in JP,551-48516,B, The trihalomethyl s-triazine compound of a description, a
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`trihalomethyl oxadiazole compound given in the US,4212976,B Description, etc. are mentioned in the
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`US,4239850,B Description.
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`[0045]Trihalomethyl s-triazine, trihalomethyl oxadiazole, and a triarylimidazole dimer are preferred also
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`in especially inside. As content of the aforementioned photopolymerization initiator to the total solids of
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`a photosensitive resin composition, the 0.5 - 20 mass % is common, and especially the 1 - 15 mass % is
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`preferred. If the aforementioned content is less than the 0.5 mass %, photosensitivity and the intensity
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`of a picture may become low, and even if it adds exceeding the 20 mass %, the effect to improved
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`efficiency will not be accepted.
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`[0046]Generally the red which is a color which constitutes a light filter as the aforementioned colorant
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`(coloring material), and green and blue paints are used. As the desirable example, the carmine 68 (C.
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`

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`|.12490), Phthalocyanine Green (C.
`mentioned.
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`|.74260), copper phthalocyanine blue (C.
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`|.74160), etc. are
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`[0047]When setting up the chromaticity of the photosensitive resin layer before polish beforehand as
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`stated above so that the chromaticity after polish may turn into a desired chromaticity, setting out of
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`the chromaticity before polish can be adjusted with the content of colorant. Although it changes with a
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`target chromaticity or grades of polish as concrete content of colorant in a photosensitive resin layer,
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`the 2 - 50 mass % of the solid content of a photosensitive resin layer is preferred, and the 5 - 45 mass %
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`is more preferred. Unless this content can be found in a mentioned range, the light filter which has a
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`desired chromaticity after polish may be unproducible.
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`[0048]In the aforementioned photosensitive resin layer, other following ingredients can be contained in
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`addition to the aforementioned ingredient. As for especially a photosensitive resin layer, it is preferred
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`that a thermal polymerization inhibitor is included. As this thermal polymerization inhibitor, for example
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`Hydroquinone, p-methoxy phenol, Di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, Benzoquinone, 4,4'-
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`thiobis(3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2-
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`mercaptobenzimidazole, phenothiazin, etc. are mentioned. To a photosensitive resin layer, a plasticizer,
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`a surface-active agent, a solvent, etc. can also be added as a publicly known additive agent, for example.
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`[0049]On temporary support, the aforementioned photosensitive tr