Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`Amendments to the Claims:
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`MTS-3683US
`
`This listing of claims will replace all prior versions, and listings, of claims in the
`
`application.
`
`Listing of Claims:
`
`1.
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`(Currently Amended) A deposition apparatus comprising:
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`a vacuum chamber;
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`a holding part which holds a base memberin the vacuum chamber;
`
`an evaporation source which hasa principal surface inclined with respect to a
`principal surface of the base memberwhichis held, and holds a deposition material; and
`
`an angle correcting memberwhich is provided so as to cover an upper space of the
`principal surface of the base member, andis provided outside a spatial region which is
`encompassed by line segments which connect a periphery of the principal surface of the
`evaporation source and a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation
`source and a principal surface facing the base member, of the angle correcting member,
`extend to a depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base memberis denoted by a
`first point and at least a center point on the principal surface of the evaporation sourceis
`denoted by a second point in a case of viewing from the front of the vacuum chamber,
`
`at least a part of the principal surface of the angle correcting memberexists on each
`line which forms 45° from the respective-first peints-pointwith respect to each line which
`connects the respeetive-first peints-pointand the second point, and another part of the
`principal surface of the angle correcting member extends to a side opposite to the
`evaporation source,
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`_ Page 2 of 12
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`

`

`Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`the angle correcting member is a member such that aspace in which an evaporation
`particle from the evaporation source does not exist is provided to confine to only the
` deposition material having a constant incident angle with respect to the base member.
`
`2.
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`- (Currently Amended) The deposition apparatus according to claim 1, wherein
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`at least the part of the principal surface of the angle correcting member exists at a
`position of a mean free path of water molecules or less away from the respeetive-first
`pointspoint.
`
`3.
`
`(Currently Amended) The deposition apparatus according to claim 2, wherein
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`the other part of the principal surface of the angle correcting member exists on each
`line which forms a second angle which is more than 45°, from the respectivefirst-peints
`point, to each line which connects the respeetive-first peints-point_and the secondpoint,
`exists at a position of a second distance which is more than the mean free path of water
`molecules away from the respeetive-first-peints_point, and a relation formula, which is
`{(45°)/(the second angle)}x(the second distance) s the mean free path, is established.
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`4.
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`(Original) The deposition apparatus according to claim 1, wherein
`
`the angle correcting memberis constituted by a plurality of members provided with
`holes or a plurality of members provided with meshesor slits.
`
`5.according_te-eiaimtA(Currently Amended) Fhe-depesition-apparatus-
`
`
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`deposition apparatus comprising:
`
`a vacuum chamber;
`
`a holding part which holds a base member in the vacuum chamber;
`
`
`an evaporation source which has a principal surface inclined with respect to a
`principal surface of the base member which is held, and holds a deposition material; and
`
`an angle correcting member which is provided so as to cover an upperspace of the
`principal surface of the base member, and isprovided outside a spatial region which is
`
`Page 3 of 12
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`

`

`Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`encompassed by line segments which connect a peripheryof theprincipal surface of the
`evaporation source and a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation
`source and _a principal surface facing the base member, of the angle correcting member,
` extend to a depth direction in a case of viewing from_a front of the vacuum chamber,
`
`whenan arbitrary point_on the principal surface of the base memberis denoted bya
`firstpoint and at least a center point on the principal surface of the evaporation sourceis
`denoted by a second point in a case of viewing from the front of the vacuum chamber,
`
`
`at least a part of the principal surface of the angle correcting member exists on each
`line which forms 45° from thefirst point with respect to each line which connects the first
`point and the second point, and another part of the principal surface of the angle correcting
`member extends to_a side opposite to the evaporation source, and wherein
`
`the angle correcting member is provided with a cooling mechanism.
`
`6.according_to-claimtA(Currently Amended) The-depesition-apparatus
`
`
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`deposition apparatus comprising:
`
`a vacuum chamber;
`
`a holding part which holds a base member in the vacuum chamber;
`
`an evaporation source which has a principal surface inclined with respect toa
`principal surface of the base member whichis held, and holds a deposition material; and
`
`
`an angle correcting member which is provided so as to cover an upper space of the
`principal surface of the base member, and isprovided outside a spatial region whichis
`encompassed by line segments which connect a periphery of the principal surface of the
`evaporation source and a peripheryof the principal surface of the base member,wherein
`
`the principal surface of the base member, the principal surface of the evaporation
`source and_a principal surface facingthe base member, of the angle correcting member,
`extend to a depth direction in a case of viewing from a front of the vacuum chamber,
`
`Page 4 of 12
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`

`

`Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`when an arbitrary point on the principal surface of the base member is denoted by a
`
`firstpoint and at least a centerpoint on the principal surface of the evaporation source is
`denoted by a second point in a case of viewingfrom the front of the vacuum chamber,
`
`at least a part of theprincipal surface of the angle correcting memberexists on each
`line which forms 45° from thefirst point with respect to each line which connects the first
`point and the secondpoint, and anotherpart of theprincipal surface of the angle correcting
`member extends to_a side opposite to the evaporation source, and wherein
`
`the angle correcting member is movable with respect to the base member during
`
`deposition.
`
`(Currently Amended) A deposition method for a deposition apparatus which
`7.
`comprises a vacuum chamber, a holding part which holds a base member in the vacuum
`chamber, an evaporation source which hasa principal surface inclined with respect to a
`principal surface of the base member which is held, and holds a deposition material, and an
`angle correcting member which is provided so as to cover an upper space of the principal
`surface of the base member, and is provided outside a spatial region which is encompassed
`by line segments which connect a periphery of the principal surface of the evaporation
`source and a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation
`source and a principal surface facing the base member, of the angle correcting member,
`extend to a depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base member is denoted by a
`first point and at least a center point on the principal surface of the evaporation source is
`denoted by a second point in a case of viewing from the front of the vacuum chamber,
`
`—
`
`
`the-base-memberprovidinga space in which an evaporation particle does not exist to
`confine to only the deposition material having a constant incident angle with respect to the
`base memberby using the angle correcting memberin which at least a part of the principal
`surface of the angle correcting memberexists on each line which forms 45° from the
`respective-first peints-point with respect to each line which connects the respective-first
`
`Page 5 of 12
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`

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`Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`peints-point and the second point, and anotherpartof the principal surface of the angle
`correcting member extends to a side opposite to the evaporation source.
`
`8.
`
`(Currently Amended) The deposition method according to claim 7, wherein
`
`at least the part of the principal surface of the angle correcting member exists at a
`position of a mean free path of gas or less, whichis introduced in the vacuum chamber, or a
`mean free path of water molecules or less, which exist in the vacuum chamber, away from
`the respeetivefirst-peints_point.
`
`9.
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`(Currently Amended) The deposition method according to claim 8, wherein
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`the other part of the principal surface of the angle correcting member exists on each
`line which forms a second angle which is more than 45°, from the respeetive-first-peints
`point, to each fine which connects the respeetive-first peints-pointand the secondpoint,
`exists at a position of a second distance which is than the mean free path of water
`_ molecules away from the respeetive-first-peints point, and a relation formula, whichis
`{(45°)/(the second angle)}x(the second distance) < the mean free path, is established.
`
`10.
`
`(Original) The deposition method according to claim 7, wherein
`
`the angle correcting memberis constituted by a plurality of members provided with
`holes or a plurality of members provided with meshesor slits.
`
`11.according-te-clain-7(Currently Amended) The-depesition-methedA
`
`
`
`deposition method for a deposition apparatus which comprises a vacuum chamber,a
`holdingpart which holds a base memberin the vacuum chamber,an evaporation source
`which has_a principal surface inclined with respect toaprincipal surface of the base member
`which is held, and holds a deposition material, and an angle correcting memberwhich is
`provided so as to cover an upper space of theprincipal surface of the base member,andis
`provided outside a spatial region whichis encompassed by line segments which connect a
`periphery of the principal surface of the evaporation source and a periphery of theprincipal
`surface of the base member, wherein
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`Page 6 of 12
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`

`

`Application No.; 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`the principal surface of the base member, the principal surface of the evaporation
`source and a principal surface facingthe base member, of the angle correcting member,
`extend to a depth direction ina case of viewingfrom a front of the vacuum chamber,
`
`whenan arbitrarypoint on theprincipal surface of the base member is denoted by a
`firstpoint and at least a center point on the principal surface of the evaporation source is
`denoted by a second point in a case of viewing from the front of the vacuum chamber,
`
`regulating a direction from which the deposition material flies over with respect to
`the base member by using the angle correcting member in which at least a part of the
`principal surface of the angle correcting member exists on each line which forms 45° from
`the first point with respect to each line which connects the first point and the secondpoint,
`and anotherpart of the principal surface of the angle correctingmember extends to a side
`opposite to the evaporation source, and wherein
`
`the angle correcting memberis provided with a cooling mechanism, and
`
`performing deposition while cooling a temperature of the angle correcting member.
`
`(Currently Amended) Fhe-depesitien-methed-according_te-claim-7_A
`12.
`deposition method for a deposition apparatus which comprises a vacuum chamber, a
`holding part which holds a base memberin the vacuum chamber,an evaporation source
`which has aprincipal surface inclined with respect to a principal surface of the base member
`which is held, and holds a deposition material, and an angle correcting member whichis
`provided so_as to cover an upperspace of theprincipal surface of the base member, and is
`provided outside aspatial region which is encompassed by line seqments which connect a
`periphery of the principal surface of the evaporation source and_a periphery of the principal
`surface of the base member, wherein
`
`the principal surface of the base member, theprincipal surface of the evaporation
`source and_aprincipal surface facing the base member, of the angle correcting member,
`extend to a depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base member is denoted by a
`first point and at least a center point on the principal surface of the evaporation source is
`denoted by a second point in a case of viewing from the front of the vacuum chamber,
`
`Page 7 of 12
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`

`

`Application No.: 14/007,681
`Amendment Dated September 15, 2015
`Reply to Office Action of June 18, 2015
`
`MTS-3683US
`
`regulating a direction from which the deposition material flies over with respect to
`the base member byusing the angle correcting member in which at least a part of the
`principal surface of the angle correcting member exists on each line which forms 45° from
` the firstpoint with respect to each line which connects the firstpoint and the secondpoint,
` and another part of the principal surface of the angle correctingmember extends to a side
`opposite to the evaporation source, and wherein
`
`the angle correcting member is movable with respect to the base member during
`deposition, and
`
`performing deposition while changing an incident angle distribution of an evaporation
`particle to the base member by moving a position of the angle correcting member to a
`different position and performing deposition at the respective positions.
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`13,
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`(New) The deposition apparatus according to claim 1, wherein
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`the angle correcting member is an object which does not emit gas and merely
`
`occupies a space.
`
`14,
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`(New) The deposition apparatus according to claim 1, wherein
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`the evaporation source does not have a mechanism which regulates an incoming
`direction of the deposition material.
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`15.
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`(New) The deposition apparatus according to claim 1, wherein
`
`in the evaporation source, an upper surface of the deposition material protrudes
`
`most.
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`16.
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`(New) The deposition apparatus according to claim 1, wherein
`
`the evaporation source is only one.
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`Page 8 of 12
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