Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`Amendments to the Claims:
`
`MTS-3683US
`
`This listing of claims will replace all prior versions andlistings of claimsin the
`
`application.
`
`Listing of Claims:
`
`1.
`
`(Currently Amended) A deposition apparatus comprising:
`
`a vacuum chamber;
`
`a holding part which holds a base member in the vacuum chamber;
`
`an evaporation source which hasa principal surface inclined with respect to a principal
`surface of the base member which is held, and holds a deposition material; and
`
`an angle correcting member whichis provided so as to cover an upper space of the
`principal surface of the base member, andis provided outside a spatial region whichis
`encompassed by line segments which connect a periphery of the principal surface of the
`evaporation source and a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation source
`and a principal surface facing the base member, of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base member is denoted byafirst
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`at least a part of the principal surface of the angle correcting memberexists on each
`
`linea line which forms 45° from the first point with respect to eachtinea line which connects the
`first point and the second point, and anotherpart of the principal surface of the angle correcting
`member extends to a side opposite to the evaporation source,
`
`the angle correcting member is-a-member-suehthatoccupies a space in which an
`
` evaporation particle from the evaporation source does not exist is-previded-to confine to only
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`Page 2 of 10
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`

`

`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`MTS-3683US
`
`the deposition material having a eenstantdesirable incident angle range with respect to the
`base member.
`
`2,
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`(Previously Presented) The deposition apparatus according to claim 1, wherein
`
`at least the part of the principal surface of the angle correcting member exists at a
`position of a mean free path of water molecules or less away from the first point.
`
`3,
`
`(Currently Amended) The deposition apparatus according to claim 2, wherein
`
`the other part of the principal surface of the angle correcting member exists on each
`linea line which forms a second angle which is more than 45°, from the first point, to eaeh
`
`linethe line which connects the first point and the second point, exists at a position of a second
`distance which is more than the mean free path of water molecules away from thefirst point,
`and a relation formula, which is {(45°)/(the second angle)}x(the second distance) < the mean
`
`free path, is established.
`
`4,
`
`(Original) The deposition apparatus according to claim 1, wherein
`
`the angle correcting member is constituted by a plurality of members provided with
`holes or a plurality of members provided with meshesor slits.
`
`5.
`(Currently Amended) A deposition apparatus comprising:
`a vacuum chamber;
`|
`
`a holding part which holds a base member in the vacuum chamber;
`
`an evaporation source which hasa principal surface inclined with respect to a principal
`surface of the base member whichis held, and holds a deposition material; and
`
`an angle correcting memberwhich is provided so as to cover an upper space of the
`principal surface of the base member, and is provided outside a spatial region which is
`encompassed by line segments which connect a periphery of the principal surface of the
`evaporation source and a periphery of the principal surface of the base member, wherein
`
`Page 3 of 10
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`

`

`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`MTS-3683US
`
`the principal surface of the base member, the principal surface of the evaporation source
`and a principal surface facing the base member,of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base memberis denoted byafirst
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`at least a part of the principal surface of the angle correcting member exists on each
`linea line which forms 45° from the first point with respect to eaehirnea line which connects the
`first point and the second point, and another part of the principal surface of the angle correcting
`member extends to a side opposite to the evaporation source, and wherein
`
`the angle correcting member is provided with a cooling mechanism.
`
`6.
`
`(Currently Amended) A deposition apparatus comprising:
`
`a vacuum chamber;
`
`a holding part which holds a base member in the vacuum chamber;
`
`an evaporation source which has a principal surface inclined with respect to a principal
`surface of the base member which is held, and holds a deposition material; and
`
`an angle correcting memberwhich is provided so as to cover an upper space of the
`principal surface of the base member, andis provided outside a spatial region which is
`encompassed by line segments which connect a periphery of the principal surface of the
`evaporation source and a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member,the principal surface of the evaporation source
`and a principal surface facing the base member, of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base member is denoted byafirst
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`Page 4 of 10
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`

`

`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`MTS-3683US
`
`at least a part of the principal surface of the angle correcting member exists on eaeR
`
`linea line which forms 45° from the first point with respect to eaehtinea line which connects the
`first point and the second point, and another part of the principal surface of the angle correcting
`member extends to a side opposite to the evaporation source, and wherein
`
`the angle correcting memberis movable with respect to the base memberduring
`deposition.
`
`(Currently Amended) A deposition method for a deposition apparatus which
`7.
`comprises a vacuum chamber, a holding part which holds a base member in the vacuum
`chamber, an evaporation source which hasa principal surface inclined with respect to a
`principal surface of the base memberwhich is held, and holds a deposition material, and an
`angle correcting member which is provided so as to cover an upper space of the principal
`surface of the base member, and is provided outside a spatial region which is encompassed by
`line segments which connect a periphery of the principal surface of the evaporation source and
`a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation source
`and a principal surface facing the base member,of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base memberis denotedbya first
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`providing a space in which an evaporation particle does not exist to confine to only the
`deposition material having a cerstant-desirable incident angle range with respect to the base
`member by using the angle correcting member in which at least a part of the principal surface
`
`of the angle correcting member exists on eaeh-Hnea line which forms 45° from the first point
`with respect to each4inea line which connects thefirst point and the second point, and another
`part of the principal surface of the angle correcting memberextends to a side opposite to the
`evaporation source.
`
`8.
`
`(Previously Presented) The deposition method according to claim 7, wherein
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`Page 5 of 10
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`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015 |.
`
`MTS-3683US
`
`at least the part of the principal surface of the angle correcting memberexists at a
`position of a mean free path of gas or less, which is introduced in the vacuum chamber, or a
`mean free path of water molecules or less, which exist in the vacuum chamber, away from the
`first point.
`
`9,
`
`(Currently Amended) The deposition method according to claim 8, wherein
`
`the other part of the principal surface of the angle correcting member exists on each
`linea line which forms a second angle which is more than 45°, from thefirst point, to eaeh
`
`inethe line which connects the first point and the second point, exists at a position of a second
`distance which is than the mean free path of water molecules away from thefirst point, and a
`relation formula, which is {(45°)/(the second angle)}x(the second distance) < the mean free
`path, is established.
`
`10,
`
`(Original) The deposition method according to claim 7, wherein
`
`the angle correcting memberis constituted by a plurality of members provided with
`holes or a plurality of members provided with meshesor slits.
`
`(Currently Amended) A deposition method for a deposition apparatus which
`11.
`comprises a vacuum chamber, a holding part which holds a base memberin the vacuum
`chamber, an evaporation source which has a principal surface inclined with respect to a
`principal surface of the base memberwhichis held, and holds a deposition material, and an
`angle correcting memberwhich is provided so as to cover an upper space of the principal
`surface of the base member, and is provided outside a spatial region which is encompassed by
`line segments which connect a periphery of the principal surface of the evaporation source and
`a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member,the principal surface of the evaporation source
`and a principal surface facing the base member,of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base memberis denoted bya first
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`Page 6 of 10
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`

`

`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`MTS-3683US
`
`regulating a direction from which the deposition material flies over with respect to the
`base member by using the angle correcting member in which at least a part of the principal
`
`surface of the angle correcting memberexists on eaehinea line which forms 45° from thefirst
`point with respect to eaehtinea line which connects the first point and the second point, and °
`another part of the principal surface of the angle correcting member extends to a side opposite
`to the evaporation source, and wherein
`
`the angle correcting member is provided with a cooling mechanism, and
`
`performing deposition while cooling a temperature of the angle correcting member.
`
`(Currently Amended) A deposition method for a deposition apparatus which
`12.
`comprises a vacuum chamber, a holding part which holds a base member in the vacuum
`chamber, an evaporation source which hasa principal surface inclined with respect to a
`principal surface of the base memberwhichis held, and holds a deposition material, and an
`angle correcting memberwhich is provided so as to cover an upper space of the principal
`surface of the base member, and is provided outside a spatial region whichis encompassed by
`line segments which connect a periphery of the principal surface of the evaporation source and
`a periphery of the principal surface of the base member, wherein
`
`the principal surface of the base member, the principal surface of the evaporation source
`and a principal surface facing the base member, of the angle correcting member, extend to a
`depth direction in a case of viewing from a front of the vacuum chamber,
`
`when an arbitrary point on the principal surface of the base memberis denoted bya first
`point and at least a center point on the principal surface of the evaporation source is denoted
`by a second point in a case of viewing from the front of the vacuum chamber,
`
`regulating a direction from which the deposition material flies over with respect to the
`base memberby using the angle correcting member in which at least a part of the principal
`
`surface of the angle correcting member exists on eacktinea_line which forms 45° from thefirst
`point with respect to eachtinea_line which connects the first point and the second point, and
`anotherpart of the principal surface of the angle correcting member extends to a side opposite
`to the evaporation source, and wherein
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`Page 7 of 10
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`

`

`Application No.: 14/007,681
`Amendment Dated January 21, 2016
`Reply to Office Action of October 28, 2015
`
`,
`
`MTS-3683US
`
`the angle correcting member is movable with respect to the base member during
`
`deposition, and
`
`performing deposition while changing an incident angle distribution of an evaporation
`particle to the base member by moving a position of the angle correcting memberto a different
`position and performing deposition at the respective positions.
`
`13. - 15.
`
`(Cancelled)
`
`16.
`
`(Previously Presented) The deposition apparatus according to claim 1, wherein
`
`the evaporation source is only one.
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`Page 8 of 10
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