UNITED STATES PATENT AND TRADEMARK OFFICE
`
`
`
`UNITED STATES DEPARTMENT OF COMMERCE
`United States Patent and Trademark Office
`Address: COMMISSIONER FOR PATENTS
`PO. Box 1450
`Alexandria, Virginia 2231371450
`www.uspto.gov
`
`14/919,325
`
`10/21/2015
`
`Tetsuhiro IWAI
`
`PIPMM-55246
`
`5145
`
`759°
`52°“
`PEARNE & GORDON LLP
`
`0mm
`
`1801 EAST 9TH STREET
`SUITE 1200
`
`CLEVELAND, OHIO 44114-3108
`UNITED STATES OF AMERICA
`
`KENDALL BENJAMIN R
`
`1718
`
`PAPER NUMBER
`
`NOTIFICATION DATE
`
`DELIVERY MODE
`
`07/18/2018
`
`ELECTRONIC
`
`Please find below and/or attached an Office communication concerning this application or proceeding.
`
`The time period for reply, if any, is set in the attached communication.
`
`Notice of the Office communication was sent electronically on above—indicated "Notification Date" to the
`
`following e—mail address(es):
`
`patdoeket@pearne.eom
`
`PTOL-90A (Rev. 04/07)
`
`

`

`Off/09 A0170” Summary
`
`Application No.
`14/919,325
`Examiner
`BENJAMIN R KENDALL
`
`Applicant(s)
`IWAI et al.
`Art Unit
`1718
`
`AIA Status
`Yes
`
`- The MAILING DA TE of this communication appears on the cover sheet wit/7 the correspondence address -
`Period for Reply
`
`A SHORTENED STATUTORY PERIOD FOR REPLY IS SET TO EXPIRE g MONTHS FROM THE MAILING
`DATE OF THIS COMMUNICATION.
`Extensions of time may be available under the provisions of 37 CFR 1.136(a). In no event, however, may a reply be timely filed
`after SIX (6) MONTHS from the mailing date of this communication.
`|f NO period for reply is specified above, the maximum statutory period will apply and will expire SIX (6) MONTHS from the mailing date of this communication.
`-
`- Failure to reply within the set or extended period for reply will, by statute, cause the application to become ABANDONED (35 U.S.C. § 133).
`Any reply received by the Office later than three months after the mailing date of this communication, even if timely filed, may reduce any
`earned patent term adjustment. See 37 CFR 1.704(b).
`
`Status
`
`1). Responsive to communication(s) filed on 07/11/2018.
`[:1 A declaration(s)/affidavit(s) under 37 CFR 1.130(b) was/were filed on
`
`2a). This action is FINAL.
`
`2b) C] This action is non-final.
`
`3)[:] An election was made by the applicant in response to a restriction requirement set forth during the interview on
`; the restriction requirement and election have been incorporated into this action.
`
`4)[:] Since this application is in condition for allowance except for formal matters, prosecution as to the merits is
`closed in accordance with the practice under Expat/7e Quay/e, 1935 CD. 11, 453 O.G. 213.
`
`Disposition of Claims*
`5)
`Claim(s)
`
`1,8—17 and 19—20 is/are pending in the application.
`
`5a) Of the above claim(s) 12,15—17 and 19—20 is/are withdrawn from consideration.
`
`E] Claim(s) _ is/are allowed.
`
`Claim(s) 1,8—11 and 13—14 is/are rejected.
`
`C] Claim(s) _
`
`is/are objected to.
`
`) ) ) )
`
`6 7
`
`8
`
`
`
`are subject to restriction and/or election requirement
`[:1 Claim(s)
`9
`* If any claims have been determined allowable, you may be eligible to benefit from the Patent Prosecution Highway program at a
`
`participating intellectual property office for the corresponding application. For more information, please see
`
`http://www.uspto.gov/patents/init events/pph/index.'sp or send an inquiry to PPeredback@uspto.gov.
`
`Application Papers
`10):] The specification is objected to by the Examiner.
`
`11). The drawing(s) filed on 10/21/2015 is/are: a). accepted or b)C] objected to by the Examiner.
`
`Applicant may not request that any objection to the drawing(s) be held in abeyance. See 37 CFR 1.85(a).
`Replacement drawing sheet(s) including the correction is required if the drawing(s) is objected to. See 37 CFR 1.121 (d).
`
`Priority under 35 U.S.C. § 119
`12). Acknowledgment is made of a claim for foreign priority under 35 U.S.C. § 119(a)-(d) or (f).
`Certified copies:
`
`a). All
`
`b)|:] Some”
`
`c)C] None of the:
`
`1..
`
`Certified copies of the priority documents have been received.
`
`21:]
`
`Certified copies of the priority documents have been received in Application No.
`
`3D Copies of the certified copies of the priority documents have been received in this National Stage
`application from the International Bureau (PCT Rule 17.2(a)).
`
`** See the attached detailed Office action for a list of the certified copies not received.
`
`Attachment(s)
`
`1) C] Notice of References Cited (PTO-892)
`
`2) E] Information Disclosure Statement(s) (PTO/SB/08a and/or PTO/SB/08b)
`Paper No(s)/Mail Date_
`U.S. Patent and Trademark Office
`
`3) C] Interview Summary (PTO-413)
`Paper No(s)/Mail Date
`4) CI Other-
`
`PTOL-326 (Rev. 11-13)
`
`Office Action Summary
`
`Part of Paper No./Mai| Date 20180712
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 2
`
`1.
`
`The present application, filed on or after March 16, 2013,
`
`is being examined
`
`under the first inventor to file provisions of the AIA.
`
`2.
`
`In the event the determination of the status of the application as subject to AIA 35
`
`U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any
`
`correction of the statutory basis for the rejection will not be considered a new ground of
`
`rejection if the prior art relied upon, and the rationale supporting the rejection, would be
`
`the same under either status.
`
`DETAILED ACTION
`
`Status of Claims
`
`3.
`
`This action is in response to Applicant’s Request for Reconsideration dated
`
`07/11/2018.
`
`4.
`
`5.
`
`6.
`
`7.
`
`Claims 1, 8-17, and 19-20 are currently pending.
`
`Claims 12, 15-17, and 19-20 have been withdrawn.
`
`Claim 1 has been amended.
`
`Claims 2-7 and 18 have been cancelled.
`
`Claim Rejections - 35 USC § 103
`
`8.
`
`This application currently names joint inventors.
`
`In considering patentability of the
`
`claims the examiner presumes that the subject matter of the various claims was
`
`commonly owned as of the effective filing date of the claimed invention(s) absent any
`
`evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to
`
`point out the inventor and effective filing dates of each claim that was not commonly
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 3
`
`owned as of the effective filing date of the later invention in order for the examiner to
`
`consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2)
`
`prior art against the later invention.
`
`9.
`
`The following is a quotation of 35 U.S.C. 103 which forms the basis for all
`
`obviousness rejections set forth in this Office action:
`
`A patent for a claimed invention maynotbe obtained, notwithstanding that the claimed
`invention is not identicallydisclosed as set forth in section 102, if the differences between the
`claimed invention and the priorartare such that the claimed invention as awhole would have
`been obvious before the effective filing date of the claimed invention to a person having
`ordinaryskill in the art to which the claimed invention pertains. Patentabilityshall notbe
`negated by the manner in which the invention was made.
`
`10.
`
`Claims 1 and 8-9 is/are rejected under 35 U.S.C. 103 as being unpatentable
`
`over Yoshida (US 5,735,993) in view of Ohkuni (US 2007/0004208) and Hama (US
`
`6,149,760).
`
`Regarding claim 1:
`
`Yoshida’993 teaches a plasma processing apparatus (plasma processing
`
`apparatus) [fig 7 & col 5-6, lines 59-4] comprising: a vessel (vacuum reaction vessel,
`
`10) which comprises a reaction chamber (space within 10), wherein atmosphere within
`
`the reaction chamber (space within 10) is capable of being depressurized (vacuum) [fig
`
`7 & col 6, lines 5-14]; a lower electrode (lower electrode, 11) which supports an object
`
`to be processed (sample, 27) within the reaction chamber (space within 10) [fig 7 & col
`
`4, lines 3-11]; a dielectric member (portion of dielectric 2 above 1a) which comprises a
`
`first surface (top of 2) and a second surface (bottom surface of 2 contacting 1a)
`
`opposite to the first surface (top of 2), and which closes an opening of the vessel (top of
`
`10) such that the first surface (top of 2) opposes an outside of the reaction chamber
`
`(outside of space within 10) and the second surface (bottom surface of 2 contacting 1a)
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 4
`
`opposes the object to be processed (sample, 27) [fig 7 & col 5-6, lines 59-4]; and a coil
`
`(flat spiral coil, 1) which opposes the first surface of the dielectric member (top of 2),
`
`and which generates plasma within the reaction chamber (space within 10) [fig 7 & col3-
`
`4, lines 52-2], wherein an electrode pattern (1a/1 b) and an insulation film (portion of
`
`dielectric 2 below 1a) which covers the electrode pattern (1a/1 b) are formed on the
`
`second surface of the dielectric member (bottom surface of 2 contacting 1a) [fig 7 & col
`
`5-6, lines 59-4], wherein the electrode pattern (1a/1 b) and the insulating film (portion of
`
`dielectric 2 below 1a) comprise a first electrode pattern (metallic plate, 1a) and a first
`
`insulation film (portion of 2 between 1a and 1b) which covers the first electrode pattern
`
`(1a) and are formed on the second surface of the dielectric member (bottom surface of
`
`2 contacting 1a), and a second electrode pattern (1b) and a second insulation film
`
`(portion of 2 below 1b) which covers the second electrode pattern (heater, 1b) and are
`
`formed on a surface of the first insulation film (bottom of portion of 2 between 1a and
`
`1b) [fig 7 & col 5-6, lines 59-4], and wherein the first electrode pattern (1a) is attached to
`
`the second surface of the dielectric member (bottom surface of 2 contacting 1a) [fig 7 &
`
`col 5-6, lines 59-4], and wherein the first electrode pattern (1a) comprises a plate
`
`electrode (metallic plate), and the second electrode pattern (1b) comprises an electric
`
`heater (heater) [fig 7 & col 5-6, lines 59-4].
`
`Yoshida’993 does not specifically disclose the first electrode pattern comprises
`
`an electric heater, and the second electrode pattern comprises a plate electrode which
`
`is capacitively coupled to the plasma in the reaction chamber when radio frequency
`
`power is supplied from a power supply which is electrically connected to the plate
`
`electrode.
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 5
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`Ohkuni teaches a first electrode pattern comprises a heater (lamps, 51), and a
`
`second electrode pattern comprises a plate electrode (Faraday shield electrode, 13)
`
`which is capacitively coupled to the plasma in the reaction chamber (chamber, 1) when
`
`radio frequency power is supplied from a power supply (15) which is electrically
`
`connected to the plate electrode (13) [fig 9 & 0072].
`
`Yoshida’993 and Ohkuni are analogous inventions in the field of inductively
`
`coupled plasma processing apparatuses.
`
`It would have been obvious to one skilled in
`
`the art before the effective date to modify the first electrode pattern and the second
`
`electrode pattern of Yoshida’993 to comprise the electric heater and the plate electrode,
`
`respectively,
`
`(i.e. reversal of parts) as in Ohkuni, to allow for a small high-frequency
`
`power to be applied since the high-frequency power loss by the dielectric is reduced in
`
`order to suppress the adhesion of the reaction products on the chamber inner surface
`
`side of the dielectric.
`
`In addition, with this configuration, since the heat generated by the
`
`heater accumulates in the plate electrode, it is possible to maintain the temperature of
`
`the dielectric wall at a high temperature [Ohkuni — 0072].
`
`Yoshida’993 modified by Ohkuni does not specifically disclose the second
`
`surface of the dielectric member being an outermost bottom surface of the dielectric
`
`member.
`
`Hama teaches the second surface of a dielectric member (bottom of 108) being
`
`an outermost bottom surface of the dielectric member (outermost surface of 108) [fig 1-
`
`2 & col 3, lines 16-27].
`
`Modified Yoshida’993 and Hama are analogous inventions in the field of
`
`inductively coupled plasma processing apparatuses.
`
`It would have been obvious to one
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 6
`
`skilled in the art before the effective date to make the dielectric member and the
`
`insulation film of modified Yoshida’993 separable structures, as in Hama, since such
`
`would allow the structure to be formed by simply stacking the structures, thereby
`
`lowering fabrication cost [Hama’760 — col 9, lines 4-10].
`
`Regarding claim 8:
`
`Yoshida’993 teaches the electric heater as a whole is disposed within the plate
`
`electrode (heater 1b is of the same geometry as the metal plate 1a) as viewed from a
`
`direction perpendicular to the second surface of the dielectric member (top-down view)
`
`[fig 7 & col 6, lines 5-14].
`
`Regarding claim 9:
`
`Yoshida’993 teaches the second surface of the dielectric member (bottom
`
`surface of 2 contacting 1a) comprises a flat portion (see horizontal depiction), and
`
`wherein the electrode pattern (1a/1 b) is formed in the flat portion (see horizontal
`
`depiction) [fig 7 & col 5-6, lines 59-4].
`
`11.
`
`Claims 10-11 and 13 is/are rejected under 35 U.S.C. 103 as being
`
`unpatentable over Yoshida (US 5,735,993) in view of Ohkuni (US 2007/0004208)
`
`and Hama (US 6,149,760) as applied to claims 1 and 8-9 above, and further in view
`
`of Yoshida (US 5,690,781).
`
`The limitations of claims 1 and 8-9 have been set forth above.
`
`Regarding claims 10— 1 1:
`
`Modified Yoshida’993 does not teach a groove is formed on the first surface of
`
`the dielectric member, and wherein at least a part of the coil is disposed in the groove;
`
`and wherein the groove has an annular shape having a center which substantially
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 7
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`overlaps with a center of the coil as viewed from a direction perpendicular to the first
`
`surface of the dielectric member.
`
`Yoshida’781 teaches a groove (surface around upwardly convex shape) is
`
`formed on the first surface of the dielectric member (top surface of 4), and wherein at
`
`least a part of the coil (spiral coil, 2) is disposed in the groove (provided to conform
`
`along the surface around convex shape) [fig SB & col 4-S, lines 56-6]; and wherein the
`
`groove (surface around upwardly convex shape) has an annular shape having a center
`
`(center of the reaction chamber) which substantially overlaps with a center of the coil
`
`(coil to be axially symmetrical about the center of the reaction chamber) as viewed from
`
`a direction perpendicular to the first surface of the dielectric member (direction depicted
`
`in fig SB) [fig SB & col 2, lines 6-38 and col 4-S, lines 56-6].
`
`Modified Yoshida’993 and Yoshida’781 are analogous inventions in the field of
`
`inductively coupled plasma processing apparatuses.
`
`It would have been obvious to one
`
`skilled in the art before the effective date to modify the dielectric member of modified
`
`Yoshida’993 with a groove in the top surface thereof, as in Yoshida’781,
`
`to achieve a
`
`uniform processing rate across the diameter of the substrate [Yoshida’781 — col 2, lines
`
`6-38].
`
`Regarding claim 13:
`
`Modified Yoshida’993 does not teach the coil comprises a conductor having a
`
`length L and extending from a first end on a center side to a second end on an outer
`
`peripheral side, wherein the conductor comprises a center side portion having a length
`
`0.5 L from a center of the coil and a remaining outer peripheral side portion, and
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 8
`
`wherein a ratio of the remaining outer peripheral side portion disposed within the groove
`
`is larger than a ratio of the center side portion disposed within the groove.
`
`Yoshida’781 teaches a coil (spiral coil, 2) comprises a conductor having a length
`
`L (length of coil from center to outer peripheral side — radius of 2) and extending from a
`
`first end on a center side (center of reaction chamber) to a second end on an outer
`
`peripheral side (outer right side of 2) [fig SB & col 2, lines 6-38 and col 4-5, lines 56-6],
`
`wherein the conductor comprises a center side portion having a length 0.5 L from a
`
`center of the coil (length of coil from center to 0.5 the distance to the outer peripheral
`
`side of 2) and a remaining outer peripheral side portion (halfway between center and
`
`outer right side of 2) [fig SB & col 2, lines 6-38 and col 4-5, lines 56-6].
`
`Yoshida’781 does not specifically disclose “a ratio of the remaining outer
`
`peripheral side portion disposed within the groove is larger than a ratio of the center
`
`side portion disposed within the groove” but teaches a ratio of the outer peripheral side
`
`portion to the center side portion (D/d) is a result-effective variable [fig 3A—3D & col 4,
`
`lines 22-41].
`
`It would have been obvious to a person of ordinary skill in the art before
`
`the effective filing date to discover the optimum range for the ratio of the outer
`
`peripheral side portion to the center side portion through routine experimentation in
`
`order to discover the optimum ratio for reducing the induction field at the center to
`
`achieve a uniform ion current density [fig 3A-3D & col 4, lines 22-41].
`
`It has been held
`
`that discovering an optimum value of a result-effective variable involves only routine skill
`
`in the art [MPEP 2144.05].
`
`lVlodified Yoshida’993 and Yoshida’781 are analogous inventions in the field of
`
`inductively coupled plasma processing apparatuses.
`
`It would have been obvious to one
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 9
`
`skilled in the art before the effective date to modify the dielectric member of modified
`
`Yoshida’993 with the groove of Yoshida’781 to achieve a uniform processing rate
`
`across the diameter of the substrate [Yoshida’781 — col 2, lines 6-38].
`
`12.
`
`Claim 14 is/are rejected under 35 U.S.C. 103 as being unpatentable over
`
`Yoshida (US 5,735,993) in view of Ohkuni (US 2007/0004208), Hama (US
`
`6,149,760), and Yoshida (US 5,690,781) as applied to claims 10-11 and 13 above,
`
`and further in view of Ghanbari (US 5,982,100).
`
`The limitations of claims 10-11 and 13 have been set forth above.
`
`Regarding claim 14:
`
`Modified Yoshida’993 does not specifically disclose a winding density of the coil
`
`in the outer peripheral side portion is larger than awinding density of the coil in the
`
`center side portion.
`
`Ghanbari does not specifically disclose “a winding density of the coil in the outer
`
`peripheral side portion is larger than a winding density of the coil in the center side
`
`portion” but teaches the winding density is a result-effective variable [fig 2 & col 3, lines
`
`51-65].
`
`It would have been obvious to one skilled in the art before the effective filing
`
`date to discover the optimum configuration for the winding density through routine
`
`experimentation in order to modify the field configuration within the plasma chamber [fig
`
`2 & col 3, lines 51-65].
`
`It has been held that discovering an optimum value of a result-
`
`effective variable involves only routine skill in the art [MPEP 2144.05].
`
`Modified Yoshida’993 and Ghanbari are analogous inventions in the field of
`
`inductively coupled plasma processing apparatuses.
`
`It would have been obvious to one
`
`skilled in the art before the coil of modified Yoshida’993 with the winding density of
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 10
`
`Ghanbari to adjust the coil to produce a more uniform plasma [Ghanbari — col 3, lines
`
`51-65].
`
`Response to Arguments
`
`13.
`
`Applicant’s arguments, see Remarks, filed 07/11/2018, with respect to the
`
`objection of c|aim(s) 15 and 19 have been fully considered and are persuasive. The
`
`objection of c|aim(s) 15 and 19 has been withdrawn in view of the corrected status
`
`identifiers.
`
`14.
`
`Applicant’s arguments, see Remarks, filed 07/11/2018, with respect to the
`
`rejection of c|aim(s) 1, 8-11, and 13-14 under 35 USC 112(b) have been fully
`
`considered and are persuasive. The rejection of c|aim(s) 1, 8-11, and 13-14 under 35
`
`USC 112(b) has been withdrawn in view of the amendments to claim 1.
`
`15.
`
`Applicant’s arguments, see Remarks, filed 07/11/2018, with respect to the
`
`rejection of c|aim(s) 1, 8-11, and 13-14 under 35 USC 103 have been fully considered
`
`but are not persuasive.
`
`Applicant argues that the rejection of record, fails to teach or suggest the newly
`
`added limitations “wherein the electric heater is attached to the outermost bottom
`
`surface of the dielectric member”. Specifically, Yoshida’993 teaches the heater is
`
`embedded in the dielectric portion 2; Ohkuni teaches the heater is located above the
`
`dielectric wall 2; and Hama does not disclose the use of a heater.
`
`In response, examiner disagrees. The combination of references teaches the
`
`newly added limitations. Specifically:
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 11
`
`Yoshida’993 teaches wherein the first electrode pattern (1a) is attached to the
`
`second surface of the dielectric member (bottom surface of 2 contacting 1a) [fig 7 & col
`
`5-6, lines 59-4].
`
`Yoshida’993 does not specifically disclose the first electrode pattern comprises
`
`an electric heater.
`
`Ohkuni teaches a first electrode pattern comprises a heater (lamps, 51), and a
`
`second electrode pattern comprises a plate electrode (Faraday shield electrode, 13) [fig
`
`9 & 0072].
`
`Yoshida’993 and Ohkuni are analogous inventions in the field of inductively
`
`coupled plasma processing apparatuses.
`
`It would have been obvious to one skilled in
`
`the art before the effective date to modify the first electrode pattern and the second
`
`electrode pattern of Yoshida’993 to comprise the electric heater and the plate electrode,
`
`respectively,
`
`(i.e. reversal of parts) as in Ohkuni, to allow for a small high-frequency
`
`power to be applied since the high-frequency power loss by the dielectric is reduced in
`
`order to suppress the adhesion of the reaction products on the chamber inner surface
`
`side of the dielectric.
`
`In addition, with this configuration, since the heat generated by the
`
`heater accumulates in the plate electrode, it is possible to maintain the temperature of
`
`the dielectric wall at a high temperature [Ohkuni — 0072].
`
`Yoshida’993 modified by Ohkuni does not specifically disclose the second
`
`surface of the dielectric member being an outermost bottom surface of the dielectric
`
`member.
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 12
`
`Hama teaches the second surface of a dielectric member (bottom of 108) being
`
`an outermost bottom surface of the dielectric member (outermost surface of 108) [fig 1-
`
`2 & col 3, lines 16-27].
`
`Modified Yoshida’993 and Hama are analogous inventions in the field of
`
`inductively coupled plasma processing apparatuses.
`
`It would have been obvious to one
`
`skilled in the art before the effective date to make the dielectric member and the
`
`insulation film of modified Yoshida’993 separable structures, as in Hama, since such
`
`would allow the structure to be formed by simply stacking the structures, thereby
`
`lowering fabrication cost [Hama’760 — col 9, lines 4-10].
`
`Conclusion
`
`16.
`
`The prior art made of record and not relied upon is considered pertinent to
`
`applicant's disclosure. Paterson etal (US 2008/0236490) teaches a gas injection port
`
`which is formed in a portion overlapping with at least a part of the slit portion when
`
`viewed in a plane view [fig 8]. Sakka etal (US 2013/0299091) teaches a gas injection
`
`port which is formed in a portion overlapping with at least a part of the window portion
`
`when viewed in a plane view [fig 9].
`
`17.
`
`Applicant's amendment necessitated the new ground(s) of rejection presented in
`
`this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP
`
`§ 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37
`
`CFR1.136(a).
`
`A shortened statutory period for reply to this final action is set to expire THREE
`
`MONTHS from the mailing date of this action.
`
`In the event a first reply is filed within
`
`

`

`Application/Control Number: 14/919,325
`Art Unit: 1718
`
`Page 13
`
`TWO MONTHS of the mailing date of this final action and the advisory action is not
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`mailed until after the end of the THREE-MONTH shortened statutory period, then the
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`shortened statutory period will expire on the date the advisory action is mailed, and any
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`extension fee pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of
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`the advisory action.
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`In no event, however, will the statutory period for reply expire later
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`than SIX MONTHS from the date of this final action.
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`18.
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`Any inquiry concerning this communication or earlier communications from the
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`examiner should be directed to BENJAMIN R KENDALL whose telephone number is
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`(571)272-5081. The examiner can normally be reached on Mon - Thurs 9-5 EST.
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`Examiner interviews are available via telephone, in-person, and video
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`conferencing using a USPTO supplied web-based collaboration tool. To schedule an
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`interview, applicant is encouraged to use the USPTO Automated Interview Request
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`(AIR) at http://www.uspto.gov/interviewpractice.
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`If attempts to reach the examiner by telephone are unsuccessful, the examiner’s
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`supervisor, Gordon Baldwin can be reached on (571)272-5166. The fax phone number
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`for the organization where this application or proceeding is assigned is 571-273-8300.
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`Information regarding the status of an application may be obtained from the
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`Patent Application Information Retrieval (PAIR) system. Status information for
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`published applications may be obtained from either Private PAIR or Public PAIR.
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`Status information for unpublished applications is available through Private PAIR only.
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`For more information about the PAIR system, see http://pair-direct.uspto.gov. Should
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`you have questions on access to the Private PAIR system, contact the Electronic
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`Business Center (EBC) at 866-217-9197 (toll-free).
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`If you would like assistance from a
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`

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`Application/Control Number: 14/919,325
`Art Unit: 1718
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`Page 14
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`USPTO Customer Service Representative or access to the automated information
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`system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000.
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`/Benjamin Kendall/
`Primary Examiner, Art Unit 1718
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`