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`CLAIMS
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`1. An elastic wave device comprising!
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`a piezoelectric substrate;
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`. an IDT electrode disposed on the piezoelectric substrate;
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`a first dielectric layer disposed on the piezoelectric substrate, the
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`first dielectric layer covering the IDT electrode; and
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`a second dielectric layer disposed over the first dielectric layer, the
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`second dielectric layer propagating a transverse wave faster than a speed
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`10
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`of a transverse wave propagating on the first dielectric layer;
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`wherein
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`a film thickness of the second dielectric layer is more than 0.8
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`times as large as wavelength X of SH wave excited by the IDT electrode; and
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`a cut angle of the piezoelectric substrate in indication of Euler
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`15
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`angles (¢, 6, and (p) is (15 ¢ 0°, 6 ¢ 0°, and (p 76 0°.
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`2. The elastic wave device of claim 1,
`
`wherein
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`the cut angle of the piezoelectric substrate is a value that makes
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`20
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`an absolute value of a power flow angle of the SH wave excited by the IDT
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`electrode to be less than 03°, and makes an absolute value of a power
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`flow angle of the Stoneley wave excited by the IDT electrode to be not less
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`than 0.3°.
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`25
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`3. The elastic wave device of claim 1,
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`
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`19
`
`wherein
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`the piezoelectric substrate is formed of lithium niobate, and
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`the cut angle of the piezoelectric substrate in indication of Euler
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`angles (¢, 6, and (9) satisfies:
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`-0.5° 5 ¢ < 5.5°,
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`'77.5° S 9 < -57.5°, and
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`-5.2° S (p < 62°.
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`4. The elastic wave device of claim 1,
`
`10
`
`wherein
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`the piezoelectric substrate is formed of lithium niobate, and
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`the cut angle of the piezoelectric substrate in indication of Euler
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`angles (¢, 9, and cp) satisfies:
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`i) When —77.5° S 9 < '72.5°,
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`15
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`'0.5° 5 ¢ < 0.5° and 22° 5 (p < '1.4°
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`or
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`0.5° S (I5 < 1.5° and '2.4° S (p < 'O.8°
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`or
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`1.5° 5 ¢ < 2.5° and -2.6° s (p < or
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`20
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`or
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`2.5° 5 ¢ < 3.5° and '2.8° S (p < 0.3°
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`or
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`3.5° 5 ¢ < 4.5° and -3.1° s (p < 08°
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`01'
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`25
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`45° _<_
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`915 < 5.5° and 33° 5 (p < 1.3°
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`
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`20
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`ii) When —72.5° S, G < -67.5°,
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`-0.5° 5 ¢ < 0.5° and -2.5° s (p < ~1.7°
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`01‘
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`0.5° 5 ¢ < 1.5° and '2.6° S (p < ‘0.9°
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`01'
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`1.5° 3 ¢ < 2.5° and -2.7° S (,0 < '0.1°
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`01'
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`2.5° 5 ¢ < 3.5° and -2.7° s (p < 07°
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`01'
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`10
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`3.5° S ¢ < 4.5° and '2.9° S (p < 13°
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`01‘
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`4.5° 5 ¢ < 5.5° and -3° 5 (p < 2°
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`iii) When ~67.5° S 6 < '62.5°,
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`-0.5° 5 ¢ < 0.5° and -3.2° s (p < -2.2°
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`15
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`01‘
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`0.5° 5 ¢ < 1.5° and -3° 5 (p < -0.9°
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`01'
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`1.5° 5 ¢ < 2.5° and -2.7° s (p < 04°
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`01‘
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`20
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`2.5° 5 ¢ < 3.5° and -2.5° s (p < 1.5°
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`OI'
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`3.5° 5 ¢ < 4.5° and -2.4° s (p < 2.6°
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`01‘
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`4.5° S (15 < 5.5° and -2.4° S (p < 3.3°
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`25
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`iv) When -62.5° s e < -57.5°,
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`
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`21
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`‘0.5° 5 (15 < 0.5° and '5.2° S (p'< '4.1°
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`or
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`O.5° 5 ¢ < 1.5° and “4° 5 (p < '0.8°
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`or
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`1.5° 5 415 < 2.5° and '2.8° S (p < 2.1°
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`or
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`2.5° 5 ¢ < 3.5° and '1.8° S (p < 4.1°
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`or
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`3.5° 5 ¢ < 4.5° and '1.1 S (p < 5.5°
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`10
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`01‘
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`4.5° S ¢ < 5.5° and '0.9° S (p < 62°.
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`5. The elastic wave device of claim 1,
`
`wherein
`
`15
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`the piezoelectric substrate is formed of lithium niobate; and
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`when the cut angle of the piezoelectric substrate is indicated by
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`Euler angles (¢, 6, and (p), and
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`correction functions F1 and F2 arei
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`[Equation 1]
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`%—0.2
`flak—0‘09
`0.12—0.08g(¢)+0.4—0.2
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`F1=————l —-——hl
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`(W
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`20
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`[Equation 2]
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`25
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`
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`22
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`a_h — 0.09
`—Z——~—g2(¢)
`0.12—0.08
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`E — 0.2
`A
`+_._.____
`0.4 — 0.2
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`F2 =
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`'
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`h2
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`(«5)
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`Whereas h is a film thickness of the IDT electrode, a is a ratio of a
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`density of the IDT electrode to a density of copper, and H is a film
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`thickness of the first dielectric layer; and
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`10
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`15
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`the g1(¢), the g2 (¢), the h1 ((15), and the h2 (¢) are:
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`[Equation 3]
`g1(¢) = 00352;»2 — 0.0852¢ — 0.3795
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`[Equation 4]
`g2(¢) = 0.0589519 — 0.4089¢ + 0.7821
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`[Equation 5]
`h1(¢) = 0.0161¢2 — 0.1175¢ + 0.6964
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`[Equation 2]
`h2(¢) = —0.0339¢2 + 0.5496(1) -1.3464;
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`the cut angle of the piezoelectric substrate satisfies:
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`i) When -77.5° _<_ 9 < -72.5°,
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`-O.5° 5 915 < 0.5° and '2.2° + F2 S (p < '1.4° + F1
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`20
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`or
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`05° 5 ¢ < 1.5° and '2.4° + F2 5 (p < '0.8° + F1
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`01'
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`1.5° 5 ¢ < 2.5° and -2.6° + F2 3 (p < -0.2° + F1
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`or
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`25
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`2.5° 5 ¢ < 3.5° and -2.8° + F2 5 (p < 0.3° + F1
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`
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`23
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`01‘
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`3.5° 5 ¢ < 4.5° and -3.1° + F2 5 (p < 08° + F1
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`01‘
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`4.5° S ¢ < 5.5° and 33° + F2 S (p < 1.3° + F1
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`ii) When '72.5° S 6 < '67.5°,
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`-O.5° _<_ ¢ < 0.5° and -2.5° + F2 5 (p < '1.7° + F1
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`01'
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`0.5° S (15 < 1.5° and 26° + F2 5 (p < 0.9" + F1
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`or
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`10
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`1.5° 3 ¢ < 2.5° and 27° + F2 5 (p < -0.1° + F1
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`01'
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`2.5° S ¢ < 3.5° and “27° + F2 5 (p < 0.7° + F1
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`01‘
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`3.5° 5 (15 < 4.5° and 29° + F2 5 (p < 1.3° + F1
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`15
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`01‘
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`4.5°: ¢ <5.5° and -3°+F25(p<2°+F1
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`111) When ~67.5° s e < -62.5°,
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`05° 5 ¢ < 0.5° and 32° + F2 5 (p < '22" + F1
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`01‘
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`20
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`0.5° 5 ¢ < 1.5° and -3° + F2 5 (p < -0.9° + F1
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`01'
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`1.5° 5 ¢ < 2.5° and -2.7° + F2 5 (p < O.4° + F1
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`01‘
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`2.5° 3 ¢ < 3.5° and 25° + F2 5 q) < 1.5° + F1
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`25
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`01‘
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`
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`24
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`3.5° 5 ¢ < 4.5° and -2.4° + F2 5 (p < 26° + F1
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`01'
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`4.5° 3 ¢ < 5.5° and -2.4° + F2 5 (p < 33° + F1
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`iv) When —62.5° s 6 < -57.5°,
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`5
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`-O.5° 5 ¢ < 0.5° and ~5.2° + F2 5 (p < -4.1° + F1
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`01'
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`0.5° 5 ¢ < 1.5° and -4° + F2 5 (p < 'O.8° + F1
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`01'
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`1.5° 5 925 < 2.5° and -2.8° +F2 s (p < 2.1° + F1
`
`10
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`01‘
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`2.5° S ¢ < 3.5° and -1.8° + F2 _<_ (p < 4.1° + F1
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`01'
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`3.5° 5 ¢ < 4.5° and -1.1° + F2 5 (p < 5.5° + F1
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`01‘
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`15
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`4.5° 5 ¢ < 5.5° and -O.9° + F2 5 (p < 6.2° + F1.
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`6. Electronic equipment comprising:
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`the elastic wave device of claim 1; and
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`a semiconductor integrated circuit device connected to the elastic
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`2 0 wave device.
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