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`UNITED STATES DEPARTMENT OF COMMERCE
`United States Patent and Trademark Office
`Address: COMMISSIONER FOR PATENTS
`PO. Box 1450
`Alexandria, Virginia 2231371450
`
`15/427,380
`
`02/08/2017
`
`BUNZI MIZUNO
`
`PIPMM-57200
`
`4267
`
`759°
`52°“
`PEARNE & GORDON LLP
`
`04’0””
`
`1801 EAST 9TH STREET
`SUITE 1200
`
`CLEVELAND, OH 44114-3108
`
`CULBERT, CHRISTOPHER A
`
`2815
`
`PAPER NUMBER
`
`NOTIFICATION DATE
`
`DELIVERY MODE
`
`04/02/2019
`
`ELECTRONIC
`
`Please find below and/or attached an Office communication concerning this application or proceeding.
`
`The time period for reply, if any, is set in the attached communication.
`
`Notice of the Office communication was sent electronically on above—indicated "Notification Date" to the
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`following e—mail address(es):
`
`patdoeket@pearne.eom
`
`PTOL-90A (Rev. 04/07)
`
`

`

`0,7709 A0170” Summary
`
`Application No.
`15/427,380
`Examiner
`CHRISTOPHERACULBERT
`
`Applicant(s)
`MIZUNO et al.
`Art Unit
`2815
`
`AIA (FITF) Status
`Yes
`
`- The MAILING DA TE of this communication appears on the cover sheet wit/7 the correspondence address -
`Period for Reply
`
`A SHORTENED STATUTORY PERIOD FOR REPLY IS SET TO EXPIRE g MONTHS FROM THE MAILING
`DATE OF THIS COMMUNICATION.
`Extensions of time may be available under the provisions of 37 CFR 1.136(a). In no event, however, may a reply be timely filed after SIX (6) MONTHS from the mailing
`date of this communication.
`|f NO period for reply is specified above, the maximum statutory period will apply and will expire SIX (6) MONTHS from the mailing date of this communication.
`-
`- Failure to reply within the set or extended period for reply will, by statute, cause the application to become ABANDONED (35 U.S.C. § 133).
`Any reply received by the Office later than three months after the mailing date of this communication, even if timely filed, may reduce any earned patent term
`adjustment. See 37 CFR 1.704(b).
`
`Status
`
`1). Responsive to communication(s) filed on 02/28/2019.
`[:1 A declaration(s)/affidavit(s) under 37 CFR 1.130(b) was/were filed on
`
`2a). This action is FINAL.
`
`2b) C] This action is non-final.
`
`3)[:] An election was made by the applicant in response to a restriction requirement set forth during the interview on
`; the restriction requirement and election have been incorporated into this action.
`
`4)[:] Since this application is in condition for allowance except for formal matters, prosecution as to the merits is
`closed in accordance with the practice under Expat/7e Quay/e, 1935 CD. 11, 453 O.G. 213.
`
`Disposition of Claims*
`
`5)
`
`Claim(s) fl is/are pending in the application.
`
`5a) Of the above claim(s) 2 is/are withdrawn from consideration.
`
`E] Claim(s)
`
`is/are allowed.
`
`Claim(s) 1 and 3—4 is/are rejected.
`
`E] Claim(s) _ is/are objected to.
`
`) ) ) )
`
`6 7
`
`8
`
`
`
`are subject to restriction and/or election requirement
`[:1 Claim(s)
`9
`* If any claims have been determined allowable, you may be eligible to benefit from the Patent Prosecution Highway program at a
`
`participating intellectual property office for the corresponding application. For more information, please see
`
`http://www.uspto.gov/patents/init events/pph/index.'sp or send an inquiry to PPeredback@uspto.gov.
`
`Application Papers
`10):] The specification is objected to by the Examiner.
`
`11):] The drawing(s) filed on
`
`is/are: a)C] accepted or b)Ej objected to by the Examiner.
`
`Applicant may not request that any objection to the drawing(s) be held in abeyance. See 37 CFR 1.85(a).
`Replacement drawing sheet(s) including the correction is required if the drawing(s) is objected to. See 37 CFR 1.121 (d).
`
`Priority under 35 U.S.C. § 119
`12)C] Acknowledgment is made of a claim for foreign priority under 35 U.S.C. § 119(a)-(d) or (f).
`Certified copies:
`
`a)C] All
`
`b)C] Some**
`
`c)C] None of the:
`
`1C] Certified copies of the priority documents have been received.
`
`2C] Certified copies of the priority documents have been received in Application No.
`
`3.[:] Copies of the certified copies of the priority documents have been received in this National Stage
`application from the International Bureau (PCT Rule 17.2(a)).
`
`** See the attached detailed Office action for a list of the certified copies not received.
`
`Attachment(s)
`
`1)
`
`Notice of References Cited (PTO-892)
`
`Information Disclosure Statement(s) (PTO/SB/08a and/or PTO/SB/08b)
`2)
`Paper No(s)/Mail Date_
`U.S. Patent and Trademark Office
`
`3) C] Interview Summary (PTO-413)
`Paper No(s)/Mail Date
`4) CI Other-
`
`PTOL-326 (Rev. 11-13)
`
`Office Action Summary
`
`Part of Paper No./Mai| Date 20190323
`
`

`

`Application/Control Number: 15/427,380
`Art Unit: 2815
`
`Page 2
`
`DETAILED ACTION
`
`Notice of Pre-AIA or AIA Status
`
`The present application, filed on or after March 16, 2013, is being examined under the first
`
`inventor to file provisions of the AIA.
`
`This Office Action is in response to Amendments filed 02/28/2019.
`
`Claim Rejections - 35 USC § 103
`
`The text of those sections ofTitle 35, U.S. Code not included in this action can be found in a
`
`prior Office action.
`
`Claims 1, 3, and 4 is/are rejected under 35 U.S.C.103 as being unpatentable over Tischler (US
`
`2013/0328172 A1) in view of Carney (US 2016/0064282 A1) and Ko et al. (US 5,817,579).
`
`Tischler discloses a method for manufacturingan element chip, comprising:
`
`a step of preparing a substrate (Fig. 2A) which has a first main surface (top surface in Fig. 2A)
`
`and a second main surface (bottom surface in Fig. 2A) and includes a first layer (10) that is a
`
`semiconductor layer(1i 0038), a second layer (40) including an insulating film (1] 0038) formed on a side
`
`of the first main surface ofthe first layer (see Fig. 2A), a plurality of element regions (corresponding to
`
`20), and a dividing region (region between areas corresponding to 20) for defining each ofthe element
`
`regions;
`
`a laser dicing step (Fig. 3; 1] 0045) of dividing the substrate to a plurality ofelement chips
`
`including the element regions by irradiating the dividing region with laser light from the side ofthe first
`
`main surface, in a state where the second main surface is supported by a supporting member (310) and
`
`forming a damaged region ofthe substrate (sidewalls of 20) on an end surface of each ofthe element
`
`chips.
`
`Tischler does not disclose a protection film stacking step. However forming protection films on
`
`the sides of singulated element chips is well-known in the art (protection film 136 in Fig. 6 of Carney).
`
`

`

`Application/Control Number: 15/427,380
`Art Unit: 2815
`
`Page 3
`
`Carney discloses that having such a protection film is advantageous in that it reduces the likelihood of
`
`unwanted electrical shorting on the side surfaces (1] 0004 of Carney). It would have been obvious to one
`
`having ordinary skill
`
`in the art to use a protection film as disclosed by Carney for the device produced by
`
`the method of Tischler for this obvious benefit.
`
`To form such a protection film, Carney discloses performing a protection film stacking step of
`
`stacking a protection film on the top and side surfaces of the element chips (1] 0029; these surfaces
`
`would correspond to on the first main surface and the end surfaces of each of the element chips
`
`including the damaged region in the method of Tischler). Carney discloses performing this step afterthe
`
`singulation ofthe elements (1] 0029; corresponding to afterthe laser dicing step of Tischler). Carney
`
`further discloses a protection film etching step (1] 0029) of removing the protection film stacked on the
`
`top surface (corresponding to the first main surface of Tischler) by etching the protection film
`
`anisotropically (1] 0029), afterthe protection film stacking step and remaining the protection film for
`
`covering the side surfaces (corresponding to the damaged regions of Tischler).
`
`Carney discloses that the protection layeris a fluorocarbon polymer and the anisotropic etch is a
`
`dry etch (1] 0029) but does not disclose what kind of dry etch. However, it is known in the art to dry etch
`
`fluorocarbon polymers using a plasma etching (”RIE”; Col. 11 Lines 41-56 of Ko et al.). There is a benefit
`
`to using such a plasma etching process as RIE is a high resolution drying etching process. With no other
`
`guidance as to what kind of dry etch to perform, it would have been obvious to one having ordinary skill
`
`in the art to perform the dry etch of Carney with a plasma etching as disclosed by K0 et al. for this
`
`benefit.
`
`Regarding claim 3, Carney discloses that the protection film stacked in the protection film
`
`stacking step contains fluorocarbon (1] 0020).
`
`Regarding claim 4, Carney does not specifically disclose that the protection film stacking step
`
`and the protection film etching step are performed in a same reaction chamber. However, Carney does
`
`

`

`Application/Control Number: 15/427,380
`Art Unit: 2815
`
`Page4
`
`disclose that the protection film stacking step can occur in a same reaction chamber as a plasma etching
`
`step (1] 0019). There is a benefit to using the same reaction chamberfor both steps in that it avoids the
`
`need to purchase additional chambers. It would have been obvious to one having ordinary skill in the art
`
`at the time ofthe invention to use the same reaction chamberfor the protection film stacking step as
`
`the protection film etching step for this benefit.
`
`Response to Arguments
`
`Applicant’s arguments with respect to claim 1 have been considered but are moot because the
`
`arguments do not apply toany ofthe references being used in the current rejection.
`
`Conclusion
`
`Applica nt's amendment necessitated the new ground(s) of rejection presented in this Office
`
`action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the
`
`extension oftime policy as set forth in 37 CFR 1.136(a).
`
`A shortened statutory period for reply to this final action is set to expire THREE MONTHSfrom
`
`the mailing date of this action.
`
`In the event a first reply is filed within TWO MONTHSof the mailing date
`
`of this final action and the advisory action is not mailed until afterthe end of the THREE-MONTH
`
`shortened statutory period, then the shortened statutory period will expire on the date the advisory
`
`action is mailed, and any extension fee pursuant to 37 CFR 1.136(a) will be calculated from the mailing
`
`date of the advisory action.
`
`In no event, however, will the statutory period for reply expire later than
`
`SIX MONTHSfrom the date ofthis final action.
`
`Any inquiry concerning this communication or ea rliercommunications from the examiner
`
`should be directed to CHRISTOPHERACULBERT whose telephone number is (571)272-4893. The
`
`examiner can normally be reached on M-F, 9-5.
`
`

`

`Application/Control Number: 15/427,380
`Art Unit: 2815
`
`Page 5
`
`Examiner interviews are available via telephone, in-person, and video conferencing using a
`
`USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use
`
`the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
`
`Ifattemptsto reach the examiner by telephone are unsuccessful, the examiner’s supervisor,
`
`Kenneth Parker can be reached on M-F, 9-5. The fax phone number for the organization where this
`
`application or proceeding is assigned is 571-273-8300.
`
`Information rega rdingthe status of an application may be obtained from the Patent Application
`
`Information Retrieval (PAIR) system. Status information for published applications may be obtained
`
`from either Private PAIR or Public PAIR. Status information for unpublished applications is available
`
`through Private PAIR only. For more information about the PAIR system, see http://pair-
`
`direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic
`
`Business Center (EBC) at 866-217-9197 (toll-free). Ifyou would like assistance from a USPTO Customer
`
`Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR
`
`CANADA) or 571-272-1000.
`
`/C.A.C/
`
`Examiner, Art Unit 2815
`
`/TUCKERJWR|GHT/
`Primary Examiner, Art Unit 2891
`
`

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