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www.uspto.gov
`
`UNITED STATES DEPARTMENT OF COMMERCE
`United States Patent and Trademark Office
`Address: COMMISSIONER FOR PATENTS
`P.O. Box 1450
`Alexandria, Virginia 2231371450
`
`15/700,600
`
`09/11/2017
`
`Tetsuhiro IWAI
`
`ISHII-57832
`
`1511
`
`759°
`52°“
`PEARNE & GORDON LLP
`
`11/29/2019
`
`1801 EAST 9TH STREET
`SUITE 1200
`
`CLEVELAND, OH 44114-3108
`
`SONG MATTHEW]
`
`1714
`
`PAPER NUMBER
`
`NOTIFICATION DATE
`
`DELIVERY MODE
`
`11/29/2019
`
`ELECTRONIC
`
`Please find below and/or attached an Office communication concerning this application or proceeding.
`
`The time period for reply, if any, is set in the attached communication.
`
`Notice of the Office communication was sent electronically on above—indicated "Notification Date" to the
`
`following e—mail address(es):
`
`patdoeket@pearne.eom
`
`PTOL-90A (Rev. 04/07)
`
`

`

`017/09 A0170” Summary
`
`Application No.
`15/700,600
`Examiner
`MATTHEWJ SONG
`
`Applicant(s)
`IWAI et al.
`Art Unit
`1714
`
`AIA (FITF) Status
`Yes
`
`- The MAILING DA TE of this communication appears on the cover sheet wit/7 the correspondence address -
`Period for Reply
`
`A SHORTENED STATUTORY PERIOD FOR REPLY IS SET TO EXPIRE g MONTHS FROM THE MAILING
`DATE OF THIS COMMUNICATION.
`Extensions of time may be available under the provisions of 37 CFR 1.136(a). In no event, however, may a reply be timely filed after SIX (6) MONTHS from the mailing
`date of this communication.
`|f NO period for reply is specified above, the maximum statutory period will apply and will expire SIX (6) MONTHS from the mailing date of this communication.
`-
`- Failure to reply within the set or extended period for reply will, by statute, cause the application to become ABANDONED (35 U.S.C. § 133).
`Any reply received by the Office later than three months after the mailing date of this communication, even if timely filed, may reduce any earned patent term
`adjustment. See 37 CFR 1.704(b).
`
`Status
`
`1)C] Responsive to communication(s) filed on
`C] A declaration(s)/affidavit(s) under 37 CFR 1.130(b) was/were filed on
`
`2a)Cj This action is FINAL.
`
`2b)
`
`This action is non-final.
`
`3). An election was made by the applicant in response to a restriction requirement set forth during the interview
`on 25 March 2019; the restriction requirement and election have been incorporated into this action.
`
`4):] Since this application is in condition for allowance except for formal matters, prosecution as to the merits is
`closed in accordance with the practice under Expade Quay/e, 1935 CD. 11, 453 O.G. 213.
`
`Disposition of Claims*
`
`5)
`
`Claim(s) wis/are pending in the application.
`
`5a) Of the above Claim(s) fl is/are withdrawn from consideration.
`
`
`
`E] Claim(ss)_is/are allowed.
`
`Claim(ss) 1_0—18 is/are rejected.
`
`D Claim(ss_) is/are objected to.
`
`) ) ) )
`
`S)
`are subject to restriction and/or election requirement
`E] Claim(s
`* If any claims have been determined allowable, you may be eligible to benefit from the Patent Prosecution Highway program at a
`
`participating intellectual property office for the corresponding application. For more information, please see
`
`http://www.uspto.gov/patents/init events/pph/index.'sp or send an inquiry to PPeredback@uspto.gov.
`
`Application Papers
`
`10)|:] The specification is objected to by the Examiner.
`
`is/are: a)D accepted or b)D objected to by the Examiner.
`11):] The drawing(s) filed on
`Applicant may not request that any objection to the drawing(s) be held in abeyance. See 37 CFR 1.85(a).
`Replacement drawing sheet(s) including the correction is required if the drawing(s) is objected to. See 37 CFR 1.121 (d).
`
`Priority under 35 U.S.C. § 119
`
`12):] Acknowledgment is made of a claim for foreign priority under 35 U.S.C. § 119(a)-(d) or (f).
`Certified copies:
`
`a)I:I All
`
`b)[:l Some**
`
`c)[:l None of the:
`
`1D Certified copies of the priority documents have been received.
`
`2E] Certified copies of the priority documents have been received in Application No.
`
`3.8 Copies of the certified copies of the priority documents have been received in this National Stage
`application from the International Bureau (PCT Rule 17.2(a)).
`
`** See the attached detailed Office action for a list of the certified copies not received.
`
`Attachment(s)
`
`1)
`
`Notice of References Cited (PTO-892)
`
`Information Disclosure Statement(s) (PTO/SB/08a and/or PTO/SB/08b)
`2)
`Paper No(s)/Mail Date 09/11/2017.
`U.S. Patent and Trademark Office
`
`3) E] Interview Summary (PTO-413)
`Paper No(s)/Mail Date
`4) CI Other-
`
`PTOL-326 (Rev. 11-13)
`
`Office Action Summary
`
`Part of Paper No./Mai| Date 20191112
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 2
`
`Notice of Pre-AIA or AIA Status
`
`1.
`
`The present application, filed on or after March 16, 2013, is being examined
`
`under the first inventor to file provisions of the AIA.
`
`DETAILED ACTION
`
`Election/Restriction
`
`2.
`
`Restriction to one of the following inventions is required under 35 U.S.C. 121:
`
`l. Claims 1-9, drawn to an apparatus, classified in H01J 5/00.
`
`ll. Claims 10-18, drawn to a method, classified in H01 L 21/00.
`
`The inventions are independent or distinct, each from the other because:
`
`3.
`
`Inventions l and II are related as process and apparatus for its practice. The
`
`inventions are distinct if it can be shown that either: (1) the process as claimed can be
`
`practiced by another and materially different apparatus or by hand, or (2) the apparatus
`
`as claimed can be used to practice another and materially different process.
`
`(MPEP §
`
`806.05(e)).
`
`In this case the apparatus as claimed can be used in another and materially
`
`different process, such as a non-plasma process, Le. a heat treatment.
`
`4.
`
`Restriction for examination purposes as indicated is proper because all the
`
`inventions listed in this action are independent or distinct for the reasons given above
`
`fl there would be a serious search and/or examination burden if restriction were not
`
`required because one or more of the following reasons apply:
`
`--the inventions require a different field of search (e.g., searching different
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 3
`
`classes/subclasses or electronic resources, or employing different search strategies or
`
`search queries).
`
`Applicant is advised that the reply to this requirement to be complete must
`
`include (i) an election of a invention to be examined even though the requirement
`
`may be traversed (37 CFR 1.143) and (ii) identification of the claims encompassing
`
`the elected invention.
`
`The election of an invention may be made with or without traverse. To reserve a
`
`right to petition, the election must be made with traverse. If the reply does not distinctly
`
`and specifically point out supposed errors in the restriction requirement, the election
`
`shall be treated as an election without traverse. Traversal must be presented at the time
`
`of election in order to be considered timely. Failure to timely traverse the requirement
`
`will result in the loss of right to petition under 37 CFR 1.144. lf claims are added after
`
`the election, applicant must indicate which of these claims are readable upon the
`
`elected invention.
`
`Should applicant traverse on the ground that the inventions are not patentably
`
`distinct, applicant should submit evidence or identify such evidence now of record
`
`showing the inventions to be obvious variants or clearly admit on the record that this is
`
`the case. In either instance, if the examiner finds one of the inventions unpatentable
`
`over the prior art, the evidence or admission may be used in a rejection under 35 U.S.C.
`
`103 or pre-AIA 35 U.S.C. 103(a) of the other invention.
`
`5.
`
`During a telephone conversation with Mike Garvey on 03/25/2019 a provisional
`
`election was made without traverse to prosecute the invention of Group II, claims 10-18.
`
`Affirmation of this election must be made by applicant in replying to this Office action.
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 4
`
`Claims 1-9 are withdrawn from further consideration by the examiner, 37 CFR 1.142(b),
`
`as being drawn to a non-elected invention.
`
`Claim Rejections - 35 USC § 103
`
`1.
`
`In the event the determination of the status of the application as subject to AIA 35
`
`U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any
`
`correction of the statutory basis for the rejection will not be considered a new ground of
`
`rejection if the prior art relied upon, and the rationale supporting the rejection, would be
`
`the same under either status.
`
`2.
`
`The following is a quotation of 35 U.S.C. 103 which forms the basis for all
`
`obviousness rejections set forth in this Office action:
`
`A patent for a claimed invention may not be obtained, notwithstanding that the claimed
`invention is not identically disclosed as set forth in section 102, if the differences between the
`claimed invention and the prior art are such that the claimed invention as a whole would have
`been obvious before the effective filing date of the claimed invention to a person having
`ordinary skill in the art to which the claimed invention pertains. Patentability shall not be
`negated by the manner in which the invention was made.
`
`3.
`
`The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148
`
`USPQ 459 (1966), that are applied for establishing a background for determining
`
`obviousness under 35 U.S.C. 103 are summarized as follows:
`
`1. Determining the scope and contents of the prior art.
`
`2. Ascertaining the differences between the prior art and the claims at issue.
`
`3. Resolving the level of ordinary skill in the pertinent art.
`
`4. Considering objective evidence present in the application indicating
`
`obviousness or nonobviousness.
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 5
`
`4.
`
`This application currently names joint inventors. In considering patentability of the
`
`claims the examiner presumes that the subject matter of the various claims was
`
`commonly owned as of the effective filing date of the claimed invention(s) absent any
`
`evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to
`
`point out the inventor and effective filing dates of each claim that was not commonly
`
`owned as of the effective filing date of the later invention in order for the examiner to
`
`consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2)
`
`prior art against the later invention.
`
`5.
`
`Claim 10, 12-14 and 16-18 is/are rejected under 35 U.S.C. 103 as being
`
`unpatentable over lwai et al (JP 2006-253365), an English computer translation (CT)
`
`has been provided, in view of Okita et al (US 2015/0059980).
`
`lwai et al teaches a plasma processing method for treatment of a substrate with
`
`use of a plasma processing apparatus (Fig 1-2), which comprises a base 2 including an
`
`electrode body 6 having a seat surface for setting a substrate 8 held on a conveying
`
`carrier (transfer arm 9), and a platform (base 2) for supporting the electrode body 6, and
`
`a lid 3 configured to be moved up and down relative to the base, wherein the lid is
`
`moved down and appressed on the platform to define a closed space and a plasma is
`
`generated within the closed space to implement a plasma processing for the substrate
`
`set on the seat surface (CT [0012]); a preparation step for preparing the conveying
`
`carrier which holds the substrate (CT [0020], Fig 4a teaches placing substrate on
`
`transfer arm and aligning with guide 7); a delivery step for delivering the conveying
`
`carrier to a position which is opposed to and away from the seat surface; a setting step
`
`for delivering the conveying carrier to a position which is opposed to and away from the
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 6
`
`seat surface (CT [0021]. Fig 4b teaches arm moved into chamber and lowering wafer
`
`onto guide portion 7); and a closing step for defining a closed space by lowering the lid
`
`after the setting step (CT [0022]-[0023]; Fig 5A).
`
`lwai does not teach the conveying carrier has a holding sheet and a frame
`
`provided around a periphery of the holding sheet; and the frame is covered by a cover.
`
`In a plasma processing method and apparatus, Okita et al teaches a plasma
`
`processing method for treatment of a substrate with use of a plasma processing
`
`apparatus 1 which comprises a base 17 including an electrode body 15,16b having a
`
`seat surface (stage 11 including chuck 16A) for setting a substrate 2 held on a
`
`conveying carrier 5, wherein the conveying carrier has a holding sheet 6 and a frame 7
`
`provided around a periphery of the holding sheet and a platform (base 2) for supporting
`
`the electrode body 6 (Figs 1-2; [0020]-[0053]). Okita et al also teaches the frame 7 is
`
`covered by the cover 28 (Figs 1-2). Okita et al teaches a using the carrier, frame and
`
`cover to etch the entire wafer and reducing thermal damage ([0044], [0053]).
`
`It would have been obvious to one of ordinary skill in the art at the time of filing to
`
`modify lwai et al by using the carrier with a holding sheet and frame and cover, as
`
`taught by Okita et al, to reduce thermal damage.
`
`Referring to claim 12, the combination of lwai et al and Okita et al teaches the
`
`guide includes a first surface opposite to the lid, a second surface opposite to the
`
`platform, and a guide surface facing to a side surface of the electrode body, and
`
`wherein at least a portion of the guide surface is closer to the lid than the seat surface
`
`when the closed space is not defined (Iwai Fig 1 and 3 show guide 7 having a stepped
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 7
`
`surface with a lower portion to support a wafer and an upper portion to support side of
`
`the wafer).
`
`Referring to claims 12-18, these are apparatus limitation without any process
`
`steps. Apparatus limitations, unless they affect the process in a manipulative sense,
`
`may have little weight in process claims. In re Tarczy-Hornoch 158 USPQ 141, 150
`
`(CCPA 1968).
`
`Referring to claim 13, the combination of lwai et al and Okita et al teaches the
`
`frame (Okita frame 7) has an outer diameter greater than that of the seat surface (,
`
`wherein the guide surface includes a guiding region provided along a circumference of
`
`the frame and a supporting surface for supporting the frame (lwai guide 7 supports
`
`wafer which would be supported by the carrier and frame of Okita), and wherein at least
`
`a portion of the guiding region is closer to the lid than the seat region when the closed
`
`space is not defined (lwai teaches stepped guide 7 in Fig 1-2).
`
`Referring to claim 14, the combination of lwai et al and Okita et al teaches an
`
`guide with inclined surface (lwai teaches stepped guide 7 in Fig 1-2).
`
`Referring to claim 16-18, the combination of lwai et al and Okita et al teaches a
`
`cover having similar shape as the frame (Okita Fig 1), and the cover not in contact when
`
`the space is open (Okita Fig 1), and the cover in contact when the process is closed
`
`(Okita Fig 2).
`
`6.
`
`Claim 11 and 15 is/are rejected under 35 U.S.C. 103 as being unpatentable over
`
`lwai et al (JP 2006-253365), an English computer translation (CT) has been provided, in
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 8
`
`view of Okita et al (US 2015/0059980), as applied to claim 10 above, and further in view
`
`of Hirakawa (US 2012/032900).
`
`The combination of lwai et al and Okita et al teaches all of the limitations of claim
`
`11, as discussed above, except the cover is connected with the lid through a first
`
`biasing means.
`
`In a substrate processing apparatus, Hirakawa teaches a cover 31 attached to a
`
`lid 11 by a biasing means (bellows 33) for moving the cover 31 in a vertical direction,
`
`and guide members 42 attached to the lid 11 by bias means 40 (Figs 1-2; [0043]—[0056])
`
`It would have been obvious to one of ordinary skill in the art at the time of filing to
`
`modify the combination of lwai et al and Okita et al by connecting the cover to the lid
`
`through a first biasing means, as taught by Hirakawa, to vertically move the lid and the
`
`cover simultaneously.
`
`Referring to claim 15, the combination of lwai et al, Okita et al and Hirakawa
`
`teaches a second bias means connected to the guide with the lid (Hirakawa teaches the
`
`guide 42 connected to lid 11 by bias means 41).
`
`Conclusion
`
`7.
`
`Any inquiry concerning this communication or earlier communications from the
`
`examiner should be directed to MATTHEW J SONG whose telephone number is
`
`(571)272-1468. The examiner can normally be reached on Monday-Friday 10AM-6PM.
`
`

`

`Application/Control Number: 15/700,600
`Art Unit: 1714
`
`Page 9
`
`Examiner interviews are available via telephone, in-person, and video
`
`conferencing using a USPTO supplied web-based collaboration tool. To schedule an
`
`interview, applicant is encouraged to use the USPTO Automated Interview Request
`
`(AIR) at http://www.uspto.gov/interviewpractice.
`
`If attempts to reach the examiner by telephone are unsuccessful, the examiner’s
`
`supervisor, Michael Kornakov can be reached on 571-272—1303. The fax phone
`
`number for the organization where this application or proceeding is assigned is 571 -
`
`273-8300.
`
`Information regarding the status of an application may be obtained from the
`
`Patent Application Information Retrieval (PAIR) system. Status information for
`
`published applications may be obtained from either Private PAIR or Public PAIR.
`
`Status information for unpublished applications is available through Private PAIR only.
`
`For more information about the PAIR system, see http://pair-direct.uspto.gov. Should
`
`you have questions on access to the Private PAIR system, contact the Electronic
`
`Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a
`
`USPTO Customer Service Representative or access to the automated information
`
`system, call 800-786-9199 (IN USA OR CANADA) or 571-272—1000.
`
`MATTHEW J. SONG
`
`Examiner
`
`Art Unit 1714
`
`/MATTHEW J SONG/
`
`Primary Examiner, Art Unit 1714
`
`

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