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UNITED STATES PATENT AND TRADEMARK OFFICE
`
`
`
`UNITED STATES DEPARTMENT OF COMMERCE
`United States Patent and Trademark Office
`Address: COMMISSIONER FOR PATENTS
`P.O. Box 1450
`Alexandria, Virginia 2231371450
`www.uspto.gov
`
`15/817,551
`
`11/20/2017
`
`Toshiaki Baba
`
`P171285US00
`
`1056
`
`WESTERMAN, HATTORI, DANIELS & ADRIAN, LLP
`8500 LEESBURG PIKE
`SUITE 7500
`
`TYSONS, VA 22182
`
`SMITH ERIC R
`
`1726
`
`PAPER NUMBER
`
`NOTIFICATION DATE
`
`DELIVERY MODE
`
`12/05/2019
`
`ELECTRONIC
`
`Please find below and/or attached an Office communication concerning this application or proceeding.
`
`The time period for reply, if any, is set in the attached communication.
`
`Notice of the Office communication was sent electronically on above—indicated "Notification Date" to the
`
`following e—mail address(es):
`
`patentmai1@ whda.eom
`
`PTOL-90A (Rev. 04/07)
`
`

`

`0/7709 A0170” Summary
`
`Application No.
`15/817,551
`Examiner
`ERIC R SMITH
`
`Applicant(s)
`Baba, Toshiaki
`Art Unit
`1726
`
`AIA (FITF) Status
`Yes
`
`- The MAILING DA TE of this communication appears on the cover sheet wit/7 the correspondence address -
`Period for Reply
`
`A SHORTENED STATUTORY PERIOD FOR REPLY IS SET TO EXPIRE g MONTHS FROM THE MAILING
`DATE OF THIS COMMUNICATION.
`Extensions of time may be available under the provisions of 37 CFR 1.136(a). In no event, however, may a reply be timely filed after SIX (6) MONTHS from the mailing
`date of this communication.
`|f NO period for reply is specified above, the maximum statutory period will apply and will expire SIX (6) MONTHS from the mailing date of this communication.
`-
`- Failure to reply within the set or extended period for reply will, by statute, cause the application to become ABANDONED (35 U.S.C. § 133).
`Any reply received by the Office later than three months after the mailing date of this communication, even if timely filed, may reduce any earned patent term
`adjustment. See 37 CFR 1.704(b).
`
`Status
`
`1). Responsive to communication(s) filed on 10/4/2019.
`CI A declaration(s)/affidavit(s) under 37 CFR 1.130(b) was/were filed on
`
`2a)[:] This action is FINAL.
`
`2b)
`
`This action is non-final.
`
`3)[:] An election was made by the applicant in response to a restriction requirement set forth during the interview
`on
`; the restriction requirement and election have been incorporated into this action.
`
`4):] Since this application is in condition for allowance except for formal matters, prosecution as to the merits is
`closed in accordance with the practice under Expade Quay/e, 1935 CD. 11, 453 O.G. 213.
`
`Disposition of Claims*
`
`5)
`
`Claim(s)
`
`13 and 17—20 is/are pending in the application.
`
`5a) Of the above claim(s)
`
`is/are withdrawn from consideration.
`
`
`
`[:1 Claim(ss)
`
`is/are allowed.
`
`Claim(ss) 13 and 17—20 is/are rejected.
`
`D Claim(ss_) is/are objected to.
`
`) ) ) )
`
`S)
`are subject to restriction and/or election requirement
`[:1 Claim(s
`* If any claims have been determined aflowable. you may be eligible to benefit from the Patent Prosecution Highway program at a
`
`participating intellectual property office for the corresponding application. For more information, please see
`
`http://www.uspto.gov/patents/init events/pph/index.jsp or send an inquiry to PPeredback@uspto.gov.
`
`Application Papers
`
`10)|:I The specification is objected to by the Examiner.
`
`is/are: a)[] accepted or b)l:] objected to by the Examiner.
`11)[:] The drawing(s) filed on
`Applicant may not request that any objection to the drawing(s) be held in abeyance. See 37 CFR 1.85(a).
`Replacement drawing sheet(s) including the correction is required if the drawing(s) is objected to. See 37 CFR 1.121 (d).
`
`Priority under 35 U.S.C. § 119
`
`12)D Acknowledgment is made of a claim for foreign priority under 35 U.S.C. § 119(a)-(d) or (f).
`Certified copies:
`
`a)I:l All
`
`b)|:] Some**
`
`c)l:I None of the:
`
`1C] Certified copies of the priority documents have been received.
`
`2C] Certified copies of the priority documents have been received in Application No.
`
`3D Copies of the certified copies of the priority documents have been received in this National Stage
`application from the International Bureau (PCT Rule 17.2(a)).
`
`** See the attached detailed Office action for a list of the certified copies not received.
`
`Attachment(s)
`
`1)
`
`Notice of References Cited (PTO-892)
`
`2) C] Information Disclosure Statement(s) (PTO/SB/08a and/or PTO/SB/08b)
`Paper No(s)/Mail Date_
`U.S. Patent and Trademark Office
`
`3) E] Interview Summary (PTO-413)
`Paper No(s)/Mail Date
`4) CI Other-
`
`PTOL-326 (Rev. 11-13)
`
`Office Action Summary
`
`Part of Paper No./Mai| Date 20191202a
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page2
`
`DETAILED ACTION
`
`Notice of Pre-AIA or AIA Status
`
`The present application, filed on or after March 16, 2013, is being examined under the first
`
`inventor to file provisions of the AIA.
`
`This is a NON-FINAL office action.
`
`Response to Arguments
`
`The amendment filed 10/4/2019 does not place the application in condition for allowance.
`
`The rejections under 35 U.S.C. 112(b) are withdrawn due toApplicant’s amendment.
`
`The previous art rejections are withdrawn due to Applica nt's arguments.
`
`New rejections follow.
`
`Claim Rejections - 35 USC § 103
`
`The text of those sections ofTitle 35, U.S. Code not included in this action can be found in a
`
`prior Office action.
`
`Claims 13 and 17 is/are rejected under 35 U.S.C. 103 as being unpatentable over US PGPub
`
`2012/0312361 to Hekmatshoar-Tabari.
`
`Regarding claims 13 and 17, Hekmatshoa r-Ta ba ri teachesa solar cell comprising
`
`a crystalline silicon substrate 10 (Fig. 5B, 110028-0030, 0056)
`
`a passivation layer 42/43 formed on a light receiving surface ofthe crystalline silicon substrate
`
`0
`
`0
`
`10 (110056, 0057)
`
`0
`
`a light receiving surface electrode 41/44 formed on the light receiving surface side of the
`
`crystalline silicon substrate 10 (110058, 0059), wherein the light receiving surface electrode
`
`comprises
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page3
`
`o
`
`a transparent conductive layer 44 formed on a whole surface of the passivation layer
`
`42/43
`
`0
`
`a collector electrode 41 formed on the transparent conductive layer 44, the collector
`
`electrode including a plurality of finger electrodes (110051, 0054 describes how light may
`
`be incident on a solar cell through a combination of a transparent conductive layer and
`
`a plurality of finger electrodes; therefore it is within the broadest reasonable
`
`interpretation to interpret the surface ofthe cell of Fig. 5B closest to the bottom of the
`
`page as a light receiving surface)
`
`0
`
`a rearsurface electrode 25/35 formed on the rearsurface of the crystalline silicon substrate 10
`
`(10051-0054).
`
`The embodiment of Fig. 5B does not specifically teach that the crystalline silicon substrate 10
`
`comprises a doped layer in the vicinity of the interface between the crystalline silicon substrate a nd the
`
`passivation layer 42/43. However, 110056 recites: ”In this embodiment, the back surface field layer 5
`
`may be omitted.” (emphasis added); a skilled artisan would interpret this wording to mean that the back
`
`surface field layer5 may optionally be included. A layer 5, seen in other embodiments of cells, is a
`
`doped layer of the crystalline silicon substrate (110035), doped to the have the same conductivity type as
`
`that of the substrate by doping a surface of the n-type crystalline silicon substrate into an n-type
`
`(110032), such that the dopant concentration is in a range from 1017 cm'3 to 1021 cm'3 (110034), with a
`
`thickness ranging from 2 nm to 10,000 nm (110033). Such a layer, if optionally included according to the
`
`reference's suggestion, would be in the vicinity of the interface between the crystalline silicon substrate
`
`and the passivation layer. A person having ordinary skill in the art would understand that a layer such as
`
`the layer5 taught by Hekmatshoar-Tabariformed from an n-type surface doped further n-type
`
`constitutes an n+ layer. Therefore it would have been obvious as of the effective filing date ofthe
`
`claimed invention for a person having ordinary skill in the art to include a doped layer in the vicinity of
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page4
`
`the interface between the crystalline silicon substrate and the passivation layer because the inclusion of
`
`such a layer is contemplated by the reference. The use of a known technique to improve similar devices
`
`(methods or products) in the same way is likely to be obvious. See KSR lnternationa/Co. v. Teleflexlnc.,
`
`550 U.S. 398, 415-421, USPQ2d 1385, 1395 — 97 (2007) (see MPEP § 2143, C.).
`
`Per claims 13 and 17, the doped layer of modified-Hekmatshoa r-Tabari is discussed as having a
`
`range of thickness that overlaps the claimed range. |nthe case where the claimed ranges ”overlap or lie
`
`inside ranges disclosed by the prior art” a primafacie case of obviousness exists. In re Wertheim, 541
`
`F.2d 257, 191 USPQ 90 (CCPA 1976); In re Woodrujj‘, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990).
`
`MPEP §2144.05.
`
`While the range of dopa nt concentrations taught by Hekmatshoa r-Ta ba ri overlaps the claimed
`
`range ”equal to or higher than 1 X 1017 cm'3”, the reference does not specifically teach that an average
`
`value of the dopa nt concentration in the doped layer is in the claimed range. The function of the doped
`
`layer is to reduce electron-hole recombination (110032). Therefore it would have been obvious as ofthe
`
`effective filing date ofthe claimed invention for a person having ordinary skill in the art to vary the value
`
`of the dopa nt concentration of the doped layer, and therefore its average value, in order to optimize
`
`electron-hole recombination.
`
`”[W]here the general conditions ofa claim are disclosed in the prior art, it is not inventive to
`
`discover the optimum or workable ranges by routine experimentation.” See In re Aller, 220 F.2d 454,
`
`456, 105 USPQ 233, 235 (CCPA 1955). The discovery of an optimum value of a known result effective
`
`variable, without producing any new or unexpected results, is within the ambit of a person of ordinary
`
`skill in the art. See In re Boesch, 205 USPQ 215 (CCPA 1980) (see MPEP § 2144.05, ||.).
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page5
`
`Claim(s) 18 and 20 is/are rejected under 35U.S.C. 103 as being obvious over Hekmatshoar-
`
`Tabari as applied to claim 13 above, and furtherin view of US PGPub 2014/0224307 to Chen (of
`
`record).
`
`Regarding claims 18 and 20, modified-Hekmatshoa r-Ta ba ri teaches the limitations of claim 13.
`
`That reference teaches that the passivation layer 42/43 may comprise n-type amorphous silicon in an
`
`embodiment (10057), but does not specifically teach that the passivation layer is n-type hydrogenated
`
`microcrystalline silicon. However, it would have been obvious as of the effective filing date of the
`
`claimed invention for a person having ordinary skill in the art to form the passivation layer to be n-type
`
`hydrogenated microcrystalline silicon, as it is common toform such layers of microcrystalline silicon as
`
`an alternative to amorphous silicon (110044, 0045 of Chen). The simple substitution of one known
`
`element for another is likely to be obvious when predictable results are achieved. See KSR International
`
`Co. v. TeleerX Inc., 550 U.S. 398,415-421, USPQ2d 1385,1395 - 97 (2007) (see MPEP § 2143, B.).
`
`Based on the reasoning above, a contact surface of the passivation |ayerof modified-
`
`Hekmatshoa r-Ta ba ri tothe transparent conductive layer comprises n-type pc-SizH.
`
`Claim(s) 19 is/are rejected under 35U.S.C. 103 as being obvious over Hekmatshoar-Tabari as
`
`applied to claim 13 above, and further in view of US PGPub 2013/0171767 to Moslehi ll (of record).
`
`Regarding claim 19, modified-Hekmatshoa r-Ta ba ri teaches the limitations of claim 13. That
`
`reference does not teach that the dopa nt concentration of the doped layer is homogeneous. However, it
`
`would have been obvious as ofthe effective filing date ofthe claimed invention for a person having
`
`ordinary skill
`
`in the art to form the doped layer to have a homogeneous dopant concentration because
`
`Moslehi || teaches that such a dopant concentration profile may provide higher efficiencies (Fig. 5,
`
`110009, 0061,0062).
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page6
`
`Response to Arguments
`
`Applica nt's arguments, see p. 5-6 ofthe Remarks, filed 10/4/2019, with respect to the
`
`rejection(s) ofclaim(s) 13 and 17-19 under Kimoto in view of Maruya ma have been fully considered and
`
`are persuasive. Therefore, the rejection has been withdrawn. However, upon further consideration, a
`
`new ground(s) of rejection is made in view of Hekmatshoa r-Ta ba ri above.
`
`Conclusion
`
`Any inquiry concerning this communication or earlier communications from the examiner
`
`should be directed to ERICR SMITH whose telephone number is (571)270-7186. The examinercan
`
`normally be reached on M-F, 8:30am-5:30pm MST.
`
`Examiner interviews are available via telephone, in-person, and video conferencing using a
`
`USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use
`
`the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
`
`Ifattemptsto reach the examiner by telephone are unsuccessful, the examiner’s supervisor,
`
`Jeffrey Barton can be reached on (571) 272-1307. The fax phone number for the organization where
`
`this application or proceeding is assigned is 571-273-8300.
`
`Information rega rdingthe status of an application may be obtained from the Patent Application
`
`Information Retrieval (PAIR) system. Status information for published applications may be obtained
`
`from either Private PAIR or Public PAIR. Status information for unpublished applications is available
`
`through Private PAIR only. For more information about the PAIR system, see http://pair-
`
`direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic
`
`Business Center (EBC) at 866-217-9197 (toll-free). Ifyou would like assistance from a USPTO Customer
`
`Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR
`
`CANADA) or 571-272-1000.
`
`

`

`Application/Control Number:15/817,551
`Art Unit21726
`
`Page7
`
`ERIC R. SMITH
`
`Primary Examiner
`Art Unit 1726
`
`/ER|CR SMITH/
`
`Primary Examiner, Art Unit 1726
`
`

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